Power devices, structures, components, and methods using lateral drift, fixed net charge, and shield
First Claim
Patent Images
1. A semiconductor device comprising:
- a first-conductivity-type source region;
a second-conductivity-type body region interposed between said source region and a semiconductor drift region;
a gate electrode which is capacitively coupled to controllably invert a portion of said body region, to controllably form therein a channel which connects said source region to said drift region;
wherein said drift region is laterally interposed between said body region and a first-conductivity-type drain region;
permanent charge, which is embedded in at least one insulating region which adjoins said drift region, and which has a polarity which tends to deplete a layer of said drift region in proximity to said insulating region;
a shield electrode, which is at least partly interposed between said gate electrode and said drain to reduce capacitive coupling between said gate and said drain; and
a dielectric-filled trench within said drift region, which lies at least partly beneath said gate electrode;
wherein said drift region is formed as a well.
1 Assignment
0 Petitions
Accused Products
Abstract
Lateral power devices where immobile electrostatic charge is emplaced in dielectric material adjoining the drift region. A shield gate is interposed between the gate electrode and the drain, to reduce the Miller charge. In some embodiments the gate electrode is a trench gate, and in such cases the shield electrode too is preferably vertically extended.
-
Citations
16 Claims
-
1. A semiconductor device comprising:
-
a first-conductivity-type source region; a second-conductivity-type body region interposed between said source region and a semiconductor drift region; a gate electrode which is capacitively coupled to controllably invert a portion of said body region, to controllably form therein a channel which connects said source region to said drift region; wherein said drift region is laterally interposed between said body region and a first-conductivity-type drain region; permanent charge, which is embedded in at least one insulating region which adjoins said drift region, and which has a polarity which tends to deplete a layer of said drift region in proximity to said insulating region; a shield electrode, which is at least partly interposed between said gate electrode and said drain to reduce capacitive coupling between said gate and said drain; and a dielectric-filled trench within said drift region, which lies at least partly beneath said gate electrode; wherein said drift region is formed as a well. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. A semiconductor device comprising:
-
a first-conductivity-type source region; a second-conductivity-type body region interposed between said source region and a semiconductor drift region of said second conductivity type; a gate electrode which is capacitively coupled to controllably invert a portion of said body region, to controllably form therein a channel which connects said source region to said drift region;
wherein said semiconductor drift region is laterally interposed between said body region and a first-conductivity-type drain region; andan insulated trench which laterally adjoins said drift region, and which contains immobile net electrostatic charge which is capacitively coupled to said drift region, and which is laterally tapered. - View Dependent Claims (12, 13, 14, 15, 16)
-
Specification