3D microscope and methods of measuring patterned substrates
First Claim
1. A method of measuring a patterned substrate sample, the patterned substrate sample including a plurality of patterned substrate features, the method comprising:
- varying a relative distance between the patterned substrate sample and an objective lens at predetermined steps;
at one or more of the predetermined steps;
projecting an image of a patterned article onto a focal plane of the objective lens;
capturing a first image with a pattern associated with the patterned article and the sample, and storing the first image in a first image array; and
capturing a second image of the sample without the pattern associated with the patterned article, and storing the second image in a second image array;
roughly determining a Z position of a background area of the patterned substrate sample using the second image array, and generating a first mask to roughly distinguish the patterned substrate features from the background area of the patterned substrate sample based on the roughly determined Z position;
generating a second mask to accurately distinguish the patterned substrate features from the background area based on the first image array and the first mask;
determining a top of each patterned substrate feature using the second mask and one of the first image array and the second image array; and
calculating geometric parameters of patterned substrate features using the second mask and the top of each patterned substrate feature.
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Abstract
A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.
31 Citations
28 Claims
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1. A method of measuring a patterned substrate sample, the patterned substrate sample including a plurality of patterned substrate features, the method comprising:
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varying a relative distance between the patterned substrate sample and an objective lens at predetermined steps; at one or more of the predetermined steps; projecting an image of a patterned article onto a focal plane of the objective lens; capturing a first image with a pattern associated with the patterned article and the sample, and storing the first image in a first image array; and capturing a second image of the sample without the pattern associated with the patterned article, and storing the second image in a second image array; roughly determining a Z position of a background area of the patterned substrate sample using the second image array, and generating a first mask to roughly distinguish the patterned substrate features from the background area of the patterned substrate sample based on the roughly determined Z position; generating a second mask to accurately distinguish the patterned substrate features from the background area based on the first image array and the first mask; determining a top of each patterned substrate feature using the second mask and one of the first image array and the second image array; and calculating geometric parameters of patterned substrate features using the second mask and the top of each patterned substrate feature. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of measuring a patterned substrate sample, the patterned substrate sample including a plurality of patterned substrate features, the method comprising:
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automatically varying a relative distance between the patterned substrate sample and an objective lens at pre-determined steps, the automatically varying including an auto-focus; at one or more of the pre-determined steps; projecting an image of a patterned article onto a focal plane of the objective lens; capturing a first image with a pattern associated with the patterned article and the sample, and storing the first image in a first image array; and capturing a second image of the sample without the pattern associated with the patterned article, and storing the second image in a second image array; roughly determining a Z position of a background area of the patterned substrate sample using the second image array, and generating a first mask to roughly distinguish the patterned substrate features from the background area of the patterned substrate sample based on the roughly determined Z position; generating a second mask to accurately distinguish the patterned substrate features from the background area based on the first image array and the first mask; determining a top of each patterned substrate feature using the second mask and one of the first image array and the second image array; and calculating geometric parameters of patterned substrate features using the second mask and the top of each patterned substrate feature. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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Specification