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Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method

  • US 9,389,519 B2
  • Filed: 01/21/2011
  • Issued: 07/12/2016
  • Est. Priority Date: 02/25/2010
  • Status: Active Grant
First Claim
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1. A measuring method of measuring a pupil transmittance distribution of an optical system to be examined which forms an image of a first surface, comprising:

  • supplying a first beam and a second beam in at least a partially overlapping manner at predetermined positions on the first surface, inclinations of the first and second beams relative to an optical axis of the optical system to be examined being different from each other;

    generating a positive order diffracted beam and a negative order diffracted beam by diffracting the first beam on the first surface;

    generating a positive order diffracted beam and a negative order diffracted beam by diffracting the second beam on the first surface;

    letting the positive order diffracted beam of the first beam, the negative order diffracted beam of the first beam, the positive order diffracted beam of the second beam, and the negative order diffracted beam of the second beam be incident on the optical system to be examined; and

    determining the pupil transmittance distribution by using a measured value of an intensity of the positive order diffracted beam of the first beam having passed through the optical system to be examined, a measured value of an intensity of the negative order diffracted beam of the first beam having passed through the optical system to be examined, a measured value of an intensity of the positive order diffracted beam of the second beam having passed through the optical system to be examined, and a measured value of an intensity the negative order diffracted beam of the second beam having passed through the optical system to be examined.

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