Positive photosensitive resin composition and method for forming pattern by using the same
First Claim
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1. A positive photosensitive resin composition, comprising:
- a novolac resin (A);
a polysiloxane (B), formed by polymerizing a compound having a structure of formula (I);
Si(R1)a (OR2)4-a (I), wherein R, represents a hydrogen atom, an alkyl group of 1 to 10 carbons, an alkenyl group of 2-10 carbons, an aromatic group of 6 to 15 carbons, an alkyl group having an anhydride group, an alkyl group having an epoxy group, or an alkoxy group having an epoxy group and at least one of the R1 comprimises an alkyl group having an anhydride group, an alkyl group having an epoxy group, or an alkoxy group having an epoxy group;
R2 represents a hydrogen atom, an alkyl group of 1 to 6 carbons, an acyl group of 1 to 6 carbons, or an aromatic group of 6 to 15 carbons;
wherein a represents an integer of 1 to 3;
an ortho-naphthoquinone diazide sulfonic acid ester (C); and
a solvent (D), wherein an amount of the polysiloxane (B) is 1 part by weight to 20 parts by weight based on 100 parts by weight of the novolac resin (A).
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Abstract
The present invention relates to a positive photosensitive resin composition and a method for forming a pattern by using the same. The positive photosensitive resin composition includes a novolac resin (A), a polysiloxane (B), an ortho-naphthoquinone diazide sulfonic acid ester (C) and a solvent (D). The novolac resin (A) includes a xylenol-type novolac resin (A-1). The xylenol-type novolac resin (A-1) is synthesized by polycondensing an aldehyde compound with a xylenol compound.
15 Citations
12 Claims
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1. A positive photosensitive resin composition, comprising:
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a novolac resin (A); a polysiloxane (B), formed by polymerizing a compound having a structure of formula (I); Si(R1)a (OR2)4-a (I), wherein R, represents a hydrogen atom, an alkyl group of 1 to 10 carbons, an alkenyl group of 2-10 carbons, an aromatic group of 6 to 15 carbons, an alkyl group having an anhydride group, an alkyl group having an epoxy group, or an alkoxy group having an epoxy group and at least one of the R1 comprimises an alkyl group having an anhydride group, an alkyl group having an epoxy group, or an alkoxy group having an epoxy group;
R2 represents a hydrogen atom, an alkyl group of 1 to 6 carbons, an acyl group of 1 to 6 carbons, or an aromatic group of 6 to 15 carbons;
wherein a represents an integer of 1 to 3;an ortho-naphthoquinone diazide sulfonic acid ester (C); and a solvent (D), wherein an amount of the polysiloxane (B) is 1 part by weight to 20 parts by weight based on 100 parts by weight of the novolac resin (A). - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method for forming a pattern, and the method is subjecting a positive photosensitive resin composition to a coating process, a pre-bake process, an exposure process, a development process, and a post-bake process in sequence to form the pattern on a substrate, wherein the positive photosensitive resin composition comprising:
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a novolac resin (A); a polysiloxane (B), formed by polymerizing a compound having a structure of formula (I); Si(R1)a (OR2)4-a (I), wherein R1 represents a hydrogen atom, an alkyl group of 1 to 10 carbons, an alkenyl group of 2-10 carbons, an aromatic group of 6 to 15 carbons, an alkyl group having an anhydride group, an alkyl group having an epoxy group, or an alkoxy group having an epoxy group and at least one of the R1 comprimises an alkyl group having an anhydride group, an alkyl group having an epoxy group, or an alkoxy group having an epoxy group;
R2 represents a hydrogen atom, an alkyl group of 1 to 6 carbons, an acyl group of 1 to 6 carbons, or an aromatic group of 6 to 15 carbons;
wherein a represents an integer of 1 to 3;an ortho-naphthoquinone diazide sulfonic acid ester (C); and a solvent (D), wherein an amount of the polysiloxane (B) is 1 part by weight to 20 parts by weight based on 100 parts by weight of the novolac resin (A). - View Dependent Claims (8, 9, 10, 11, 12)
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Specification