Systems and methods for controlling a plasma edge region
First Claim
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1. A system comprising:
- a top electrode and a bottom electrode for generating an electric field;
one or more upper insulating rings surrounding a portion of the top electrode;
a lower insulating ring surrounding a portion of the bottom electrode;
an upper electrode extension surrounding a portion of the one or more upper insulating rings;
a lower electrode extension surrounding a portion of the lower insulating ring, wherein at least a portion of a plasma center region is formed between the top electrode and the bottom electrode, wherein at least a portion of a plasma edge region is formed between the upper electrode extension, the lower electrode extension, and a C-shroud; and
a control circuit having an inductor, the control circuit being connected to the upper electrode extension for filtering a first radio frequency signal provided to the upper electrode extension, wherein the top electrode is coupled with ground and the upper electrode extension is coupled with a variable capacitor and the inductor, wherein the variable capacitor is coupled in parallel with the inductor, and a controller that is coupled with the control circuit, wherein the controller is configured to adjust a capacitance of the variable capacitor to provide an impedance to the upper electrode extension such that a potential of a top plasma sheath within the plasma edge region is in phase with a potential of a bottom plasma sheath within the plasma edge region.
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Abstract
Systems and methods for controlling a plasma edge region are described. One of the systems includes a top electrode and a bottom electrode. The system also includes an upper electrode extension and a lower electrode extension. At least a portion of the plasma edge region is formed between the upper electrode extension and the lower electrode extension. The system includes a circuit to control a radio frequency signal at the upper electrode extension.
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Citations
12 Claims
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1. A system comprising:
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a top electrode and a bottom electrode for generating an electric field; one or more upper insulating rings surrounding a portion of the top electrode; a lower insulating ring surrounding a portion of the bottom electrode; an upper electrode extension surrounding a portion of the one or more upper insulating rings; a lower electrode extension surrounding a portion of the lower insulating ring, wherein at least a portion of a plasma center region is formed between the top electrode and the bottom electrode, wherein at least a portion of a plasma edge region is formed between the upper electrode extension, the lower electrode extension, and a C-shroud; and a control circuit having an inductor, the control circuit being connected to the upper electrode extension for filtering a first radio frequency signal provided to the upper electrode extension, wherein the top electrode is coupled with ground and the upper electrode extension is coupled with a variable capacitor and the inductor, wherein the variable capacitor is coupled in parallel with the inductor, and a controller that is coupled with the control circuit, wherein the controller is configured to adjust a capacitance of the variable capacitor to provide an impedance to the upper electrode extension such that a potential of a top plasma sheath within the plasma edge region is in phase with a potential of a bottom plasma sheath within the plasma edge region. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A system for controlling a plasma edge region, comprising a control circuit for filtering a radio frequency signal to apply to an upper electrode extension, the upper electrode extension other than a top electrode of a plasma chamber, the plasma edge region formed between the upper electrode extension, a lower electrode extension of the plasma chamber, and a C-shroud, the control circuit coupled to the upper electrode extension, and the top Electrode is coupled with ground, the control circuit including an inductor and a variable capacitor,
the inductor coupled in parallel with the variable capacitor, and a controller that is coupled with the control circuit, wherein the controller is configured to adjust a capacitance of the variable capacitor to provide an impedance to the upper electrode extension such that a potential of a top plasma sheath within the plasma edge region is in phase with a potential of a bottom plasma sheath within the plasma edge region.
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12. A method comprising:
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receiving a coupling with a plasma edge region via an upper electrode extension, the plasma edge region located within a plasma region, the plasma edge region located between an upper electrode extension, a lower electrode extension, and a C-shroud, the plasma region including a plasma center region, the plasma center region formed between a top electrode and a bottom electrode; filtering a radio frequency signal via a variable capacitor and an inductor, wherein the variable capacitor is coupled in parallel with the inductor, wherein filtering the radio frequency signal includes adjusting a capacitance of the variable capacitor to provide an impedance to the upper electrode extension such that a potential of a top plasma sheath within the plasma edge region is in phase with a potential with a potential of a bottom plasma sheath within the plasma edge region, wherein filtering the radio frequency signal is performed to generate a filtered signal; and applying the filtered radio frequency signal to the upper electrode extension when the top electrode is coupled with ground.
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Specification