Programmable structured arrays
First Claim
Patent Images
1. A method of operating a semiconductor device, said method comprising:
- controlling a pass-gate that is in a layer of said device, according to an output of a configuration circuit that is also in said layer of said device;
said pass-gate connecting electrically a first metal line and a second metal line in response to said output having a first state; and
said pass-gate disconnecting electrically said first metal line from said second metal line in response to said output having a second state.
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Abstract
A programmable semiconductor device includes a user programmable switch comprising a configurable element positioned above a transistor material layer deposited on a substrate layer.
177 Citations
20 Claims
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1. A method of operating a semiconductor device, said method comprising:
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controlling a pass-gate that is in a layer of said device, according to an output of a configuration circuit that is also in said layer of said device; said pass-gate connecting electrically a first metal line and a second metal line in response to said output having a first state; and said pass-gate disconnecting electrically said first metal line from said second metal line in response to said output having a second state. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of operating a semiconductor device comprising a plurality of pass-gates, a first plurality of wires, and a second plurality of wires, said method comprising:
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turning on a pass-gate of said plurality of pass-gates in response to receiving at said pass-gate an output having a first state from a configuration circuit, wherein said pass-gate and said configuration circuit are in a same layer of said device; said pass-gate, when turned on, connecting electrically a first metal wire of said first plurality of wires and a second metal wire of said second plurality of wires; turning off said pass-gate in response to receiving at said pass-gate an output having a second state from said configuration circuit; and said pass-gate, when turned off disconnecting electrically said first metal wire from said second metal wire. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A method of fabricating a semiconductor device, said method comprising:
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forming a first plurality of wires in a first layer of said device; forming a second plurality of wires in a second layer of said device; and forming a plurality of pass-gates and a configuration circuit in a third layer of said device between said first layer and said second layer;
wherein said pass-gates are configured to be selectively turned on to enable one or more types of electrical connections, said types of electrical connections comprising;
an electrical connection between two wires in said first layer;
an electrical connection between two wires in said second layer; and
an electrical connection between a wire in said first layer and a wire in said second layer. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification