Extracting comprehensive design guidance for in-line process control tools and methods
First Claim
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1. A computer-implemented method for generating information for setting up process control for a wafer, comprising:
- automatically identifying potential marginalities in a design for a device to be formed on a wafer; and
automatically generating information for the potential marginalities, wherein the automatically generated information is used to set up process control for the wafer, and wherein said automatically identifying and said automatically generating are performed by one or more computer systems.
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Abstract
Methods and systems for extracting comprehensive design guidance for in-line process control of wafers are provided. One method includes automatically identifying potential marginalities in a design for a device to be formed on a wafer. The method also includes automatically generating information for the potential marginalities. The automatically generated information is used to set up process control for the wafer.
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Citations
53 Claims
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1. A computer-implemented method for generating information for setting up process control for a wafer, comprising:
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automatically identifying potential marginalities in a design for a device to be formed on a wafer; and automatically generating information for the potential marginalities, wherein the automatically generated information is used to set up process control for the wafer, and wherein said automatically identifying and said automatically generating are performed by one or more computer systems. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A non-transitory computer-readable medium, storing program instructions executable on a computer system for performing a computer-implemented method for generating information for setting up process control for a wafer, wherein the computer-implemented method comprises:
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automatically identifying potential marginalities in a design for a device to be formed on a wafer; and automatically generating information for the potential marginalities, wherein the automatically generated information is used to set up process control for the wafer.
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28. A system configured to generate information for setting up process control for a wafer, comprising:
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a process control tool configured to determine information for one or more characteristics of a physical version of a wafer on which at least a portion of a device has been formed; and one or more computer subsystems configure for; automatically identifying potential marginalities in a design for the device; and automatically generating information for the potential marginalities, wherein the automatically generated information is used to set up process control for the wafer performed by the process control tool. - View Dependent Claims (29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53)
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Specification