Semiconductor device
First Claim
1. A semiconductor device comprising a transistor in a semiconductor substrate including a main surface, the transistor comprising:
- a source region of a first conductivity type;
a drain region of the first conductivity type;
a channel region of a second conductivity type;
a gate electrode; and
a field plate,wherein the source region and the drain region are disposed along a first direction, the first direction is parallel to the main surface, the channel region is disposed between the source region and the drain region, the channel region is patterned into a ridge extending along the first direction by adjacent trenches extending in the first direction in the semiconductor substrate, the gate electrode is disposed in a first one of the trenches adjacent to the channel region, the gate electrode is absent from a second one of the trenches adjacent to the channel region, and the field plate is disposed in field plate trenches which are separate from the trenches.
2 Assignments
0 Petitions
Accused Products
Abstract
A semiconductor device includes a transistor formed in a semiconductor substrate including a main surface. The transistor includes a source region, a drain region, a channel region, and a gate electrode. The source region and the drain region are disposed along a first direction, the first direction being parallel to the main surface. The channel region has a shape of a ridge extending along the first direction, the ridge including a top side and a first and a second sidewalls. The gate electrode is disposed at the first sidewall of the channel region, and the gate electrode is absent from the second sidewall of the channel region.
33 Citations
11 Claims
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1. A semiconductor device comprising a transistor in a semiconductor substrate including a main surface, the transistor comprising:
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a source region of a first conductivity type; a drain region of the first conductivity type; a channel region of a second conductivity type; a gate electrode; and a field plate, wherein the source region and the drain region are disposed along a first direction, the first direction is parallel to the main surface, the channel region is disposed between the source region and the drain region, the channel region is patterned into a ridge extending along the first direction by adjacent trenches extending in the first direction in the semiconductor substrate, the gate electrode is disposed in a first one of the trenches adjacent to the channel region, the gate electrode is absent from a second one of the trenches adjacent to the channel region, and the field plate is disposed in field plate trenches which are separate from the trenches. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification