Calibration of MEMS sensor

• US 9,403,671 B2
• Filed: 06/30/2011
• Issued: 08/02/2016
• Est. Priority Date: 06/30/2011
• Status: Active Grant

• Current Assignee: Hewlett-Packard Development Company, L.P. (HP Inc.)
• Original Assignee: Hewlett-Packard Development Company, L.P. (HP Inc.)
• Inventors: Homeijer, Brian D., Bicknell, Robert Newton
• Primary Examiner(s): Macchiarolo, Peter
• Assistant Examiner(s): Megna Fuentes, Anthony W
• Application Number:
  US14/116,092
• Publication Number:
  US 20140083164A1
• Time in Patent Office: 1,860 Days
• Field of Search: 73 137- 138, 73/18.2, 73/17.5, 73/17.7
• US Class Current: 1/1
• CPC Class Codes: B81B 2201/0235 Accelerometers
• CPC Class Codes: B81B 3/0064 Constitution or structural means for improving or controlling the physical properties of a device
• CPC Class Codes: B81C 99/003 Characterising MEMS devices, e.g. measuring and identifying electrical or mechanical constants
• CPC Class Codes: G01H 11/00 Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties
• CPC Class Codes: G01V 1/162 Details
• CPC Class Codes: G01V 13/00 Manufacturing, calibrating, cleaning, or repairing instruments or devices covered by groups G01V1/00 – G01V11/00

Abstract

A micro electromechanical systems (MEMS) sensor is excited. The response of the MEMS sensor is measured. The MEMS sensor is calibrated.

Claims

1. A method comprising:

exciting a micro electromechanical systems (MEMS) sensor, via an electrical impulse, to cause a flexure of the MEMS sensor to vibrate and ring down;

measuring a mechanical response of the MEMS sensor resulting from excitation of the MEMS sensor, as a voltage corresponding to vibration and the ring down of the flexure over time;

determining a parameter of the MEMS sensor based on the response of the MEMS sensor that has been measured, by fitting a damped sinusoidal function corresponding to the vibration and the ring down over time to determine a resonant frequency and a Q value of the flexure; and

,

calibrating the MEMS sensor based on the parameter of the MEMS sensor that has been determined.

2. The method of claim 1, further comprising deploying the MEMS sensor in a field environment in which the MEMS sensor is to be employed to measure an external stimulus, prior to exciting the MEMS sensor, such that the MEMS sensor is calibrated in the field environment in which the MEMS sensor is deployed.

3. The method of claim 1, wherein exciting the MEMS sensor comprises applying the electrical impulse to a plurality of electrodes of the MEMS sensor.

4. The method of claim 3, wherein the mechanical response is the vibration and the ring down of the flexure of the MEMS sensor, the voltage measured using the electrodes of the MEMS sensor.

5. The method of claim 4, wherein the parameter of the MEMS sensor is determined by a processor of the MEMS sensor.

6. The method of claim 5, wherein calibrating the MEMS sensor comprises calibrating the mechanical response of the MEMS sensor, by calibrating a ratio of a physical displacement of the flexure of the MEMS sensor to acceleration of the MEMS sensor, based on the resonant frequency and the Q value of the flexure, the mechanical response of the MEMS sensor calibrated by the processor of the MEMS sensor.

11. The method of claim 1, calibrating the MEMS sensor at least partially compensates for one or more of:

excessive noise resulting from wind within a field environment in which the MEMS sensor is deployed;

excessive noise resulting from human activity within the field environment in which the MEMS sensor is deployed;

temperature changes within the field environment in which the MEMS sensor is deployed;

atmospheric pressure changes within the field environment in which the MEMS sensor is deployed.

7. A micro electromechanical systems (MEMS) sensor comprising:

a flexure configured to physically displace responsive to an external stimulus;

a plurality of electrodes to which an electrical sweep is applied to provide the external stimulus, and configured to indirectly detect physical displacement of the flexure via a measurement of an electrical response resulting from the external stimulus, as an alternating current (AC) voltage resulting from vibration of the flexure; and

a processor configured to determine a parameter of the MEMS sensor by determining a change in the AC voltage corresponding to the vibration of the flexure per phase of the AC voltage, and configured to calibrate the electrical response of the MEMS sensor by calibrating a ratio of a voltage output by the MEMS sensor to the physical displacement of the flexure based on the ratio of the change in the AC voltage to the phase of the AC voltage.

8. The MEMS sensor of claim 7, wherein the processor is to calibrate the MEMS sensor to at least partially compensate for one or more of:

excessive noise resulting from wind within a field environment in which the MEMS sensor is deployed;

excessive noise resulting from human activity within the field environment in which the MEMS sensor is deployed;

temperature changes within the field environment in which the MEMS sensor is deployed;

atmospheric pressure changes within the field environment in which the MEMS sensor is deployed.

9. A system comprising:

an array of MEMS sensors, each MEMS sensor being individually calibratable in a field environment in which the array is deployed, each MEMS sensor comprising;

a flexure configured to physically displace responsive to an external stimulus;

a plurality of electrodes configured to detect physical displacement of the flexure, via a measurement of a mechanical response of the MEMS sensor and an electrical response of the MEMS sensor; and

one or more processors configured to calibrate the MEMS sensors responsive to known forced excitations of the flexures, based on detections of the physical displacements of the flexures by the electrodes, by calibrating an overall sensitivity of each MEMS sensor expressed as a ratio of voltage to acceleration of the MEMS sensor, based on the mechanical response and the electrical response of the MEMS sensor.

10. The system of claim 9, wherein the processors are to calibrate the MEMS sensor to at least partially compensate for one or more of:

excessive noise resulting from wind within a field environment in which the MEMS sensor is deployed;

excessive noise resulting from human activity within the field environment in which the MEMS sensor is deployed;

temperature changes within the field environment in which the MEMS sensor is deployed;

atmospheric pressure changes within the field environment in which the MEMS sensor is deployed.