Methodology and apparatus for testing conductive adhesive within antenna assembly

• US 9,404,842 B2
• Filed: 08/15/2013
• Issued: 08/02/2016
• Est. Priority Date: 08/15/2013
• Status: Active Grant

• Current Assignee: Apple Inc.
• Original Assignee: Apple Inc.
• Inventors: Nickel, Joshua G., Chen, Chun-Lung, Yang, Tseng-Mau, Merz, Nicholas G., Schlub, Robert W., Shiu, Boon W., Tong, Erica J.
• Primary Examiner(s): Caputo, Lisa
• Assistant Examiner(s): Plumb, Nigel
• Application Number:
  US13/968,166
• Publication Number:
  US 20150050893A1
• Time in Patent Office: 1,083 Days
• Field of Search: 731/50.A, 738/27, 738/18, 737/88, 455/67.14
• US Class Current: 1/1
• CPC Class Codes: G01N 19/04 Measuring adhesive force between materials, e.g. of sealing tape, of coating
• CPC Class Codes: G01N 3/08 by applying steady tensile or compressive forces G01N3/28 takes precedence
• CPC Class Codes: G01N 3/24 by applying steady shearing forces G01N3/26, G01N3/28 take precedence
• CPC Class Codes: G01N 3/56 Investigating resistance to wear or abrasion
• CPC Class Codes: H04B 17/16 Test equipment located at the transmitter

Abstract

Damage to conductive material that serves as bridging connections between conductive structures within an electronic device may result in deficiencies in radio-frequency (RF) and other wireless communications. A test system for testing device structures under test is provided. Device structures under test may include substrates and a conductive material between the substrates. The test system may include a test fixture for increasing tensile or compressive stress on the device structures under test to evaluate the resilience of the conductive material. The test system may also include a test unit for transmitting RF test signals and receiving test data from the device structures under test. The received test data may include scattered parameter measurements from the device structures under test that may be used to determine if the device structures under test meet desired RF performance criteria.

Claims

1. A method for using a test system to characterize device structures under test, where the test system includes a test unit and a test fixture, the method comprising:

activating pressure-sensitive adhesive material in the device structures under test by applying pressure to the adhesive material;

once the pressure-sensitive adhesive material has been activated, applying stress to the device structures under test with the test fixture; and

while the stress is applied to the device structures under test, gathering test data on the device structures under test with the test unit, wherein the gathered test data comprises radio-frequency scattering parameter measurements.

2. The method defined in claim 1, wherein applying the stress to the device structures under test further comprises applying compressive stress to the device structures under test and applying tensile stress to the device structures under test.

3. The method defined in claim 1, wherein applying the stress to the device structures under test comprises applying different amounts of stress to the device structures under test.

4. A method for using a test system to characterize device structures under test, wherein the test system includes a test unit and a test fixture and wherein the device structures under test include an adhesive material, the method comprising:

with the test fixture, applying tensile stress to the device structures under test;

while the tensile stress is applied to the device structures under test, gathering radio-frequency scattering parameter measurements on the device structures under test with the test unit; and

with the test unit, determining whether the adhesive material exhibits any defects by analyzing the gathered radio-frequency scattering parameter measurements.

5. The method defined in claim 4, further comprising:

applying compressive stress to the device structures under test with the test fixture.

6. The method defined in claim 4, wherein the adhesive material is conductive, the method further comprising:

analyzing the gathered radio-frequency scattering parameter measurements to determine whether the adhesive material satisfies design criteria.

7. The method defined in claim 4, wherein gathering the radio-frequency scattering parameter measurements comprises gathering reflection coefficient measurements on the device structures under test.

8. The method defined in claim 4, wherein gathering the radio-frequency scattering parameter measurements comprises gathering multiport scattering parameter measurements on the device structures under test.

9. The method defined in claim 4, wherein applying the tensile stress comprises increasing the applied tensile stress at regular increments.

10. A test system, comprising:

a test fixture that is configured to receive device structures under test and that is configured to apply tensile stress on device structures under test while the device structures under test are received within the test fixture;

a test unit configured to gather test data on the device structures under test; and

a test probe that receives radio-frequency test signals from the test unit and that is coupled to the device structures under test.

11. The test system defined in claim 10, wherein the test fixture is further configured to activate an adhesive material in the device structures under test while the device structures under test are received within the test fixture.

12. The test system defined in claim 10, wherein the test probe comprises a signal conductor and a ground conductor, and wherein the device structures under test are interposed between the signal conductor and the ground conductor while the device structures under test are received within the test fixture.

13. The test system defined in claim 10, further comprising:

a radio-frequency cable having a first end that is coupled to the test unit and a second end that is mated to a corresponding coaxial cable in the device structures under test via a radio-frequency coaxial test connector.

14. The test system defined in claim 10, wherein the test unit comprises a radio-frequency tester operable to gather scattering parameter measurements on the device structures under test.