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Method and device for characterizing an electron beam using an X-ray detector with a patterned aperture resolver and patterned aperture modulator

  • US 9,406,483 B1
  • Filed: 12/17/2015
  • Issued: 08/02/2016
  • Est. Priority Date: 01/21/2015
  • Status: Active Grant
First Claim
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1. A method for verifying an electron beam, said method comprising the steps of:

  • arranging a patterned aperture resolver having at least one opening in front of at least one X-ray detector, where said at least one opening is facing towards said at least one X-ray detector;

    arranging a patterned aperture modulator between said patterned aperture resolver and a substrate and at a predetermined distance from said patterned aperture resolver and said substrate, said patterned aperture modulator having a plurality of openings in at least a first direction;

    scanning an electron beam in at least said first direction on said substrate for generating X-rays to be received by said at least one X-ray detector; and

    verifying at least one of a position, size and shape of said electron beam by comparing a detected intensity modulation of said X-ray signal by said detector with corresponding reference values, wherein said electron beam is said to be verified if a deviation of said detected intensity modulation and said reference value is smaller than a predetermined value.

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