Writer pole formation

• US 9,411,234 B2
• Filed: 10/01/2014
• Issued: 08/09/2016
• Est. Priority Date: 10/01/2014
• Status: Active Grant

• Current Assignee: Seagate Technology LLC (Seagate Technology Holdings Plc)
• Original Assignee: Seagate Technology LLC (Seagate Technology Holdings Plc)
• Inventors: Liu, Yi, Bowser, Aaron M., Yu, Dan, Zhang, Xiaohong
• Primary Examiner(s): ALANKO, ANITA KAREN
• Application Number:
  US14/503,589
• Publication Number:
  US 20160099019A1
• Time in Patent Office: 678 Days
• Field of Search: None
• US Class Current: 1/1
• CPC Class Codes: C09K 13/00 Etching, surface-brightening or pickling compositions for glass C03C15/00, C03C25/66; for mortars, concrete, artificial or natural stone or ceramics C04B41/5338 ; for metallic material C23F, C23G1/00, C25F1/00; for semi-conductors H01L
• CPC Class Codes: C23F 1/02 Local etching
• CPC Class Codes: C23F 4/04 by physical dissolution
• CPC Class Codes: G03F 7/20 Exposure; Apparatus therefor photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: G03F 9/708 Mark formation
• CPC Class Codes: G11B 5/314 where the layers are extra layers normally not provided in the transducing structure, e.g. optical layers G11B5/3196 takes precedence
• CPC Class Codes: G11B 5/8404 manufacturing base layers
• CPC Class Codes: G11B 5/855 Coating only part of a support with a magnetic layer
• CPC Class Codes: H01L 2223/54426 for alignment

Abstract

Implementations disclosed herein provide a method of reducing the topography at the alignment and overlay marks area during the writer pole photolithography process in order to reduce the wafer scale variation and reduce the writer pole photolithography process rework rate. In one implementation, an intermediate stage of a wafer for writer pole formation is generated by removing a part of at least one metallic writer pole layer on top of an intermediate stage writer pole wafer to form a recovery trench, depositing an optically transparent material on top of the wafer, wherein the thickness of the optically transparent material is higher than a target recovery trench topography, forming a photoresist pattern on top of the optically transparent material over the recovery trench, etching the optically transparent material, and removing the photoresist pattern and at least part of the remaining optically transparent material.

Claims

1. A method comprising:

removing a part of at least one metallic writer pole layer on top of an intermediate stage writer pole wafer to form a recovery trench;

depositing an optically transparent material on top of the wafer, wherein the thickness of the optically transparent material is higher than a target recovery trench topography;

forming a photoresist pattern on top of the optically transparent material over the recovery trench;

etching the optically transparent material; and

removing the photoresist pattern and at least part of the remaining optically transparent material.

2. The method of claim 1, wherein removing multiple metallic writer pole layers includes performing milling.

3. The method of claim 1, wherein the recovery trench is located over an alignment mark of the wafer.

4. The method of claim 1, wherein the recovery trench is located over an overlay mark of the wafer.

5. The method of claim 1, wherein forming the photoresist pattern includes performing photolithography.

6. The method of claim 1, wherein the optically transparent material is alumina.

7. The method of claim 1, wherein etching the optically transparent material is a wet etching process.

8. The method of claim 1, wherein etching the optically transparent material includes etching optically transparent material on the top of the wafer on sides of the photoresist pattern generated over the recovery trench.

9. The method of claim 1, wherein depositing the optically transparent material is performed by sputtering.

10. The method of claim 1, wherein depositing the optically transparent material is performed by plasma enhanced vapor deposition.

11. The method of claim 1, wherein depositing the optically transparent material is performed by atomic layer deposition.

12. The method of claim 1, wherein removing part of the deposited optically transparent material includes a chemical mechanical process.

13. The method of claim 1, wherein removing at least part of the optically transparent material comprises removing at least part of the optically transparent material until the top surface of the optically transparent material is substantially at a same level as the top level of the remainder of the wafer.

14. A method of forming an intermediate stage writer pole wafer comprising:

removing a part of at least one metallic writer pole layer on top of the writer pole wafer to form a recovery trench;

depositing alumina on top of the wafer filling the recovery trench, wherein a thickness of the alumina is higher than a target recovery trench topography;

forming a photoresist pattern on top of the alumina over the recovery trench;

wet etching the alumina; and

chemically removing the photoresist; and

removing at least part of a remaining part of the alumina.

15. The method of claim 14, wherein the recovery trench is located over an overlay and an alignment of the wafer.

16. The method of claim 14, wherein removing multiple metallic writer pole layers includes performing milling.

17. The method of claim 14, wherein forming the photoresist pattern includes performing photolithography.

18. The method of claim 14, wherein etching the alumina includes etching alumina on the top of the wafer on sides of the photoresist pattern generated over the recovery trench.

19. The method of claim 14, wherein depositing the optically transparent material is performed by one of sputtering, plasma enhanced vapor deposition, and atomic layer deposition.

20. The method of claim 14, wherein removing part of the deposited optically transparent material includes a chemical mechanical process.