Hybrid waveguide lasers and methods for fabricating hybrid waveguide lasers
First Claim
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1. A sub-micron III-V waveguide laser comprising:
- a local-epitaxy-grown channel waveguide having a width in the range between 50 nm and 800 nm and a height in the range between 500 nm and 1200 nm, wherein the channel waveguide has a first lateral side and a second lateral side;
a lateral cladding layer adjacent to the first lateral side and the second lateral side of the channel waveguide; and
a light confinement element for confining light in the local-epitaxy-grown channel waveguide, wherein the light confinement element comprises an overlay covering the channel waveguide and containing a high refractive index material having a refractive index that is higher than a refractive index of the lateral cladding layer.
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Abstract
The present disclosure relates to a method for integrating a sub-micron III-V waveguide laser on a semiconductor photonics platform as well as to a corresponding device/system. The method comprises providing on a semiconductor substrate an electrically insulating layer, etching a trench having a width in the range between 50 nm and 800 nm through the electrically insulating layer, thereby locally exposing the silicon substrate, providing a III-V layer stack in the trench by local epitaxial growth to form a channel waveguide, and providing a light confinement element for confining radiation in the local-epitaxial-grown channel waveguide.
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20 Claims
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1. A sub-micron III-V waveguide laser comprising:
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a local-epitaxy-grown channel waveguide having a width in the range between 50 nm and 800 nm and a height in the range between 500 nm and 1200 nm, wherein the channel waveguide has a first lateral side and a second lateral side; a lateral cladding layer adjacent to the first lateral side and the second lateral side of the channel waveguide; and a light confinement element for confining light in the local-epitaxy-grown channel waveguide, wherein the light confinement element comprises an overlay covering the channel waveguide and containing a high refractive index material having a refractive index that is higher than a refractive index of the lateral cladding layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 14, 15, 16)
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10. A method for integrating a sub-micron III-V waveguide laser on a semiconductor photonics platform, the method comprising:
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providing on a semiconductor substrate an electrically insulating layer; etching a trench having a width in the range between 50 nm and 800 nm through the electrically insulating layer, thereby locally exposing the silicon substrate; providing a III-V layer stack in the trench by local epitaxial growth to form a channel waveguide; and providing a light confinement element for confining radiation in the local-epitaxial-grown channel waveguide, wherein providing the light confinement element includes providing an overlay, wherein the overlay is a layer overlaying the III-V layer stack and containing a high refractive index material having a refractive index that is higher than a refractive index of the electrically insulting layer. - View Dependent Claims (11, 12, 13, 17, 18)
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19. A sub-micron III-V waveguide laser comprising:
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a local-epitaxy-grown channel waveguide having a width in the range between 50 nm and 800 nm and a height in the range between 500 nm and 1200 nm, wherein the channel waveguide has a first lateral side and a second lateral side; a lateral cladding layer adjacent to the first lateral side and the second lateral side of the channel waveguide; and a light confinement element for confining light in the local-epitaxy-grown channel waveguide, wherein the light confinement element comprises a plateau provided in the lateral cladding layer at the first lateral side and at the second lateral side of the channel waveguide. - View Dependent Claims (20)
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Specification