IC layout pattern matching and classification system and method
First Claim
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1. A method for classifying patterns in a set of layout patterns, comprising:
- computing a plurality of moments for each of a plurality of pattern windows of an integrated circuit layout, wherein the set of layout patterns is provided using a hardware scanner; and
classifying the pattern windows into pattern classes using a distance computation for respective moments of the pattern windows by comparing the distance computation to an error value to determine similarities between the pattern windows, wherein the patterns include one or more components of a layout, wherein classifying reveals a set of patterns for inclusion in a permissible set of patterns for a given technology node.
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Abstract
A system and method for restricting the number of layout patterns by pattern identification, matching and classification, includes decomposing the pattern windows into a low frequency component and a high frequency component using a wavelet analysis for an integrated circuit layout having a plurality of pattern windows. Using the low frequency component as an approximation, a plurality of moments is computed for each pattern window. The pattern windows are classified using a distance computation for respective moments of the pattern windows by comparing the distance computation to an error value to determine similarities between the pattern windows.
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20 Claims
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1. A method for classifying patterns in a set of layout patterns, comprising:
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computing a plurality of moments for each of a plurality of pattern windows of an integrated circuit layout, wherein the set of layout patterns is provided using a hardware scanner; and classifying the pattern windows into pattern classes using a distance computation for respective moments of the pattern windows by comparing the distance computation to an error value to determine similarities between the pattern windows, wherein the patterns include one or more components of a layout, wherein classifying reveals a set of patterns for inclusion in a permissible set of patterns for a given technology node. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method for classifying patterns in a set of layout patterns, comprising:
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computing a plurality of moments for each of a plurality of pattern windows of an integrated circuit layout using a low frequency component of a wavelet analysis as an approximation, wherein the set of layout patterns is provided using a hardware scanner; and classifying the pattern windows into pattern classes using a distance computation for respective moments of the pattern windows by comparing the distance computation to an error value to determine similarities between the pattern windows, wherein classifying reveals a set of patterns for inclusion in a permissible set of patterns for a given technology node. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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Specification