Fabrication of low defectivity electrochromic devices
First Claim
1. A method of fabricating an electrochromic device, the method comprising, in the following order:
- a. depositing a first portion of a metal oxide layer;
b. lithiating the first portion of the metal oxide layer with elemental lithium; and
thenc. depositing a second portion of the metal oxide layer on the first portion of the metal oxide laver.
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0 Petitions
Accused Products
Abstract
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.
226 Citations
25 Claims
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1. A method of fabricating an electrochromic device, the method comprising, in the following order:
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a. depositing a first portion of a metal oxide layer; b. lithiating the first portion of the metal oxide layer with elemental lithium; and
thenc. depositing a second portion of the metal oxide layer on the first portion of the metal oxide laver. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An electrochromic device comprising a metal oxide layer formed, in the following order:
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a. depositing a first portion of the metal oxide layer; b. lithiating the first portion with elemental lithium; and
thenc. depositing a second portion of the metal oxide layer on the first portion of the metal oxide layer. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification