Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE)
First Claim
1. A semiconductor device comprising:
- a patterned substrate having a plurality of spaced apart features separated by a space wherein said plurality of features have inclined sidewalls, wherein said plurality of features is above a surface of the substrate in said space; and
a Group III-Nitride film formed on said patterned substrate wherein said Group III-Nitride film has a first crystal orientation in said space between said plurality of features and wherein said Group III-Nitride film has a second crystal orientation on said inclined sidewalls of said features wherein the second crystal orientation is different than the first crystal orientation, and wherein said first crystal orientation formed in said space is formed on and over said second crystal orientation formed on said inclined sidewalls of said features.
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Abstract
A method of depositing a high quality low defect single crystalline Group III-Nitride film. A patterned substrate having a plurality of features with inclined sidewalls separated by spaces is provided. A Group III-Nitride film is deposited by a hydride vapor phase epitaxy (HVPE) process over the patterned substrate. The HVPE deposition process forms a Group III-Nitride film having a first crystal orientation in the spaces between features and a second different crystal orientation on the inclined sidewalls. The first crystal orientation in the spaces subsequently overgrows the second crystal orientation on the sidewalls and in the process turns over and terminates treading dislocations formed in the first crystal orientation.
57 Citations
16 Claims
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1. A semiconductor device comprising:
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a patterned substrate having a plurality of spaced apart features separated by a space wherein said plurality of features have inclined sidewalls, wherein said plurality of features is above a surface of the substrate in said space; and a Group III-Nitride film formed on said patterned substrate wherein said Group III-Nitride film has a first crystal orientation in said space between said plurality of features and wherein said Group III-Nitride film has a second crystal orientation on said inclined sidewalls of said features wherein the second crystal orientation is different than the first crystal orientation, and wherein said first crystal orientation formed in said space is formed on and over said second crystal orientation formed on said inclined sidewalls of said features. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A semiconductor device comprising:
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a patterned substrate having a plurality of spaced apart features separated by a space wherein said plurality of features have inclined sidewalls; and a Group III-Nitride film formed on said patterned substrate wherein said Group III-Nitride film has a first crystal orientation in said space between said plurality of features and wherein said Group III-Nitride film has a second crystal orientation on said inclined sidewalls of said features, wherein said Group III-Nitride film having said second crystal orientation on said inclined sidewalls is a micro/nanocrystalline film and wherein said first crystal orientation is formed on said second crystal orientation. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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Specification