Method for producing an optoelectronic component, and an optoelectronic component
First Claim
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1. A method for producing an optoelectronic component, comprising:
- providing a semiconductor layer sequence having at least one active region, wherein the at least one active region emits electromagnetic radiation during operation; and
applying, with an ion assisted application method, at least one layer directly on a first surface of the semiconductor layer sequence such that the at least one layer has a peak-to-peak roughness of less than approximately 4 nm,applying, with an ion assisted application method, at least one layer directly on a second surface of the semiconductor layer sequence such that the at least one layer has a peak-to-peak roughness of less than approximately 4 nm, the second surface arranged on a side of the semiconductor layer sequence that is remote from the first surface,wherein material applied by the ion assisted application method is one of;
ionized and accelerated in an electric field towards the semiconductor layer sequence, andaccelerated by at least one of an ionized gas and an ionized gas beam,wherein the second surface comprises a radiation exit area,wherein the applying the at least one layer on the first surface consists of applying a plurality of layer pairs, each of said layer pairs consisting of a first layer and a second layer,wherein the applying the at least one layer on the second surface consists of applying a plurality of layer pairs, each of said layer pairs consisting of a first layer and a second layer,wherein each first layer consists of tantalum pentoxide,wherein each second layer comprises silicon dioxide,wherein each of the first and second layers has a thickness of approximately a quarter of the wavelength of the electromagnetic radiation emitted by the active region of the semiconductor layer sequence, andwherein a number of layer pairs on the second surface is less than a number of layer pairs on the first surface.
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Abstract
A method for producing an optoelectronic component comprising the steps of providing a semiconductor layer sequence having at least one active region, wherein the active region is suitable for emitting electromagnetic radiation during operation, and applying at least one layer on a first surface of the semiconductor layer sequence by means of an ion assisted application method.
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Citations
10 Claims
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1. A method for producing an optoelectronic component, comprising:
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providing a semiconductor layer sequence having at least one active region, wherein the at least one active region emits electromagnetic radiation during operation; and applying, with an ion assisted application method, at least one layer directly on a first surface of the semiconductor layer sequence such that the at least one layer has a peak-to-peak roughness of less than approximately 4 nm, applying, with an ion assisted application method, at least one layer directly on a second surface of the semiconductor layer sequence such that the at least one layer has a peak-to-peak roughness of less than approximately 4 nm, the second surface arranged on a side of the semiconductor layer sequence that is remote from the first surface, wherein material applied by the ion assisted application method is one of; ionized and accelerated in an electric field towards the semiconductor layer sequence, and accelerated by at least one of an ionized gas and an ionized gas beam, wherein the second surface comprises a radiation exit area, wherein the applying the at least one layer on the first surface consists of applying a plurality of layer pairs, each of said layer pairs consisting of a first layer and a second layer, wherein the applying the at least one layer on the second surface consists of applying a plurality of layer pairs, each of said layer pairs consisting of a first layer and a second layer, wherein each first layer consists of tantalum pentoxide, wherein each second layer comprises silicon dioxide, wherein each of the first and second layers has a thickness of approximately a quarter of the wavelength of the electromagnetic radiation emitted by the active region of the semiconductor layer sequence, and wherein a number of layer pairs on the second surface is less than a number of layer pairs on the first surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification