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Reducing MEMS stiction by deposition of nanoclusters

  • US 9,434,602 B2
  • Filed: 07/30/2014
  • Issued: 09/06/2016
  • Est. Priority Date: 07/30/2014
  • Status: Active Grant
First Claim
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1. A method for manufacturing a microelectromechanical systems (MEMS) device, the method comprising:

  • forming a structural layer over a substrate;

    forming a mask layer over the structural layer, wherein the mask layer is formed with a material selective to an etching process;

    forming a plurality of nanoclusters on the mask layer;

    using the nanoclusters as a mask for removing portions of the mask layer; and

    etching the structural layer using remaining portions of the mask layer as a mask for the etching of the structural layer forming a plurality of surface roughness features on a travel stop of the MEMS device.

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