Methods to form and to dismantle hermetically sealed chambers

• US 9,440,424 B2
• Filed: 05/05/2014
• Issued: 09/13/2016
• Est. Priority Date: 05/05/2014
• Status: Active Grant

• Current Assignee: Corning Incorporated
• Original Assignee: Picosys Incorporated
• Inventors: Karam, Raymond Miller, Wynne, Thomas, Chobot, Anthony Thomas
• Primary Examiner(s): HO, TU TU V
• Application Number:
  US14/270,265
• Publication Number:
  US 20150314585A1
• Time in Patent Office: 862 Days
• Field of Search: 257/698, 257/420, 438/118, 438/15
• US Class Current: 1/1
• CPC Class Codes: B01L 2200/0689 Sealing
• CPC Class Codes: B01L 2300/0816 Cards, e.g. flat sample carriers usually with flow in two horizontal directions
• CPC Class Codes: B01L 2300/0887 Laminated structure
• CPC Class Codes: B01L 2400/0481 squeezing of channels or chambers
• CPC Class Codes: B01L 3/50273 characterised by the means or forces applied to move the fluids micropumps F04B19/006, of the membrane type F04B43/043
• CPC Class Codes: B32B 2037/0092 in which absence of adhesives is explicitly presented as an advantage
• CPC Class Codes: B32B 2310/00 Treatment by energy or chemical effects
• CPC Class Codes: B32B 2310/0843 using laser
• CPC Class Codes: B32B 2439/80 Medical packaging
• CPC Class Codes: B32B 2535/00 Medical equipment, e.g. bandage, prostheses, catheter medical patches B32B2556/00
• CPC Class Codes: B32B 37/0076 characterised in that the layers are not bonded on the totality of their surfaces
• CPC Class Codes: B32B 37/06 characterised by the heating method
• CPC Class Codes: B32B 38/0008 Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation heat treatment B32B38/0036
• CPC Class Codes: B32B 38/0036 Heat treatment for heating or cooling of layers during lamination B32B37/06, B32B37/08
• CPC Class Codes: B32B 43/00 Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
• CPC Class Codes: B32B 43/006 Delaminating
• CPC Class Codes: Y10T 156/1195 Delaminating from release surface
• CPC Class Codes: Y10T 156/1972 Shearing delaminating means

Abstract

Embodiments generally relate to methods for forming and dismantling a hermetically sealed chamber. In one embodiment, the method comprises using room temperature laser bonding to create a hermetic seal between a first element and a second element to form a chamber. A bond interface of the hermetic seal is configured to allow the hermetic seal to be opened under controlled conditions using a release technique. In one embodiment, the chamber is formed within a microfluidic chip and the chamber is configured to hold a fluid. In one embodiment a chip comprises a first hermetic seal bonding first and second elements to create a first chamber and a second hermetic seal bonding third and fourth elements to create a second chamber encompassing the first chamber. The first hermetic seal may be broken open independently of the second hermetic seal by the application of a mechanical or thermal technique.

Claims

1. A method for forming a hermetically sealed chamber, the method comprising:

using room temperature laser bonding to create a hermetic seal between a first element and a second element to form the chamber;

wherein a bond interface of the hermetic seal is configured to allow the hermetic seal to be broken open under controlled conditions using a release technique;

wherein the chamber is formed within is a microfluidic chip comprising a via connected to the chamber; and

wherein the chamber is configured to hold a fluid.

2. A method for forming a hermetically sealed chamber on a chip, the method comprising:

using room temperature laser bonding to create a hermetic seal between a first element and a second element to form the chamber;

wherein a bond interface of the hermetic seal is configured to allow the hermetic seal to be broken open under controlled conditions using a release technique;

wherein the release technique comprises a mechanical technique that creates sufficient tensile or shear stress at the bond interface to open the hermetic seal.

3. The method of claim 2 wherein the creation of a tensile or shear stress comprises introducing a tool to the vicinity of the bond interface without any contact occurring between the tool and any material within the chamber.

4. The method of claim 3 wherein the breaking of the hermetic seal results in the complete separation of the first and second elements of the chip.

5. The method of claim 2 wherein the creation of a tensile or shear force comprises bending the chip by a predetermined amount such that a shear stress sufficient to break the hermetic seal is internally generated at the bond interface, the bond interface being at a predetermined distance from the neutral axis of the chip.

6. The method of claim 2 wherein the creation of a tensile or shear force comprises twisting the chip as many times as necessary to cause sufficient shear stresses at the bond interface to break the hermetic seal.

7. The method of claim 2 wherein a structural feature fabricated into the chip facilitates the application of the mechanical technique that creates sufficient tensile or shear force at the bond interface to open the hermetic seal.

8. The method of claim 7 wherein the structural feature comprises an undercut at or in close proximity to the bond interface, the undercut configured to accept the insertion of a tool to break open the hermetic seal.

9. A method for forming a hermetically sealed chamber, the method comprising:

using room temperature laser bonding to create a hermetic seal between a first element and a second element to form the chamber;

wherein a bond interface of the hermetic seal is configured to allow the hermetic seal to be broken open under controlled conditions using a release technique; and

wherein the release technique comprises a thermal technique, the first element comprising a first material having a first coefficient of expansion, and the second element comprising a second material having a second coefficient of expansion, different from the first coefficient of expansion.

10. The method of claim 9 wherein the thermal technique comprises the application of radiant energy from a laser beam.

11. The method of claim 9 wherein the thermal technique comprises using a patterned thin metal film as a conductive lead to generate heat by electrical resistance.

12. A method for encapsulating materials on a flow cell chip, the method comprising:

using room temperature laser bonding to create a first hermetic seal between a first element and a second element encapsulating a first material within a first chamber of the flow cell chip, wherein a first bond interface of the first hermetic seal is configured to allow the first hermetic seal to be broken open under controlled conditions using a release technique; and

using room temperature laser bonding to create a second hermetic seal between a third element and a fourth element encapsulating a second material within a second chamber of the flow cell chip, wherein a second bond interface of the second hermetic seal is configured to allow the second hermetic seal to be broken open under controlled conditions using a release technique.

13. The method of claim 12 further comprising;

using room temperature laser bonding to create a third hermetic seal between a fifth element and a sixth element encapsulating the first chamber and the second chamber within a third chamber, wherein a third bond interface of the third hermetic seal is configured to be strong enough to withstand stresses characteristic of normal handling and anticipated environmental conditions, wherein the third bond interface is configured to allow the third hermetic seal to be broken open under controlled conditions using a release technique, and wherein either one of the first and second hermetic seals may be broken open under controlled conditions without breaking open the other one of the first and second hermetic seals and without breaking open the third hermetic seal.