Flexible display apparatus and method of manufacturing the same

• US 9,443,915 B2
• Filed: 04/28/2015
• Issued: 09/13/2016
• Est. Priority Date: 09/15/2014
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: Kim, Jeongho, Koo, Hyunwoo, Kim, Kihyun, Kim, Sunho, Kim, Taewoong, Mo, Yeongon, Kachatryan, Hayk
• Primary Examiner(s): DANG, PHUC T
• Application Number:
  US14/698,045
• Publication Number:
  US 20160079320A1
• Time in Patent Office: 504 Days
• Field of Search: 257/88
• US Class Current: 1/1
• CPC Class Codes: H10K 2102/00 Constructional details relating to the organic devices covered by this subclass
• CPC Class Codes: H10K 2102/311 Flexible OLED
• CPC Class Codes: H10K 59/12 Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/1201 Manufacture or treatment
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/80 using temporary substrates
• CPC Class Codes: H10K 77/111 Flexible substrates
• CPC Class Codes: Y02E 10/549 Organic PV cells
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product

Abstract

Provided is a method of manufacturing a flexible display apparatus, the method including forming a sacrificial layer on a support substrate; forming a first material layer having a higher hydrogen concentration than the sacrificial layer on the sacrificial layer; forming a second material layer, preventing hydrogen diffusion from the first material layer to a flexible substrate, on the first material layer; forming the flexible substrate on the second material layer; forming a display layer on the flexible substrate; and irradiating a laser onto the support substrate to delaminate the sacrificial layer from the first material layer.

Claims

1. A method of manufacturing a flexible display apparatus, the method comprising:

forming a sacrificial layer on a support substrate;

forming a first material layer having a higher hydrogen concentration than the sacrificial layer on the sacrificial layer;

diffusing hydrogen from the first material layer into the sacrificial layer;

forming a second material layer, preventing hydrogen diffusion from the first material layer to a flexible substrate, and increasing a rate of hydrogen diffusing from the first material layer into the sacrificial layer, on the first material layer, the second material layer including a metal oxide;

forming the flexible substrate on the second material layer;

forming a display layer on the flexible substrate; and

irradiating a laser onto the support substrate to delaminate the sacrificial layer from the first material layer.

2. The method as claimed in claim 1, wherein the sacrificial layer includes amorphous silicon (a-Si).

3. The method as claimed in claim 1, wherein the first material layer includes silicon nitride (SiN_x).

4. The method as claimed in claim 1, wherein the metal oxide includes Al₂O₃.

5. The method as claimed in claim 1, further comprising forming a barrier layer after forming the flexible substrate and before forming the display layer.

6. A method of manufacturing a flexible display apparatus, the method comprising:

forming a sacrificial layer on a support substrate;

forming a first material layer having a higher hydrogen concentration than the sacrificial layer on the sacrificial layer;

diffusing hydrogen from the first material layer into the sacrificial layer;

forming, on the first material layer, a second material layer preventing hydrogen from diffusing to a side opposite of a side on which the sacrificial layer is located, and increasing a rate of hydrogen diffusing from the first material layer into the sacrificial layer, the second material layer including a metal oxide;

forming a display layer on the second material layer; and

irradiating a laser onto the support substrate to delaminate the sacrificial layer from the first material layer.

7. The method as claimed in claim 6, wherein the sacrificial layer includes amorphous silicon (a-Si).

8. The method as claimed in claim 6, wherein the first material layer includes silicon nitride (SiN_x).

9. The method as claimed in claim 6, wherein the metal oxide includes Al₂O₃.

10. The method as claimed in claim 6, further comprising forming a barrier layer after forming the second material layer and before forming the display layer.

11. A flexible display apparatus, comprising:

a first material layer including silicon nitride (SiN_x);

a barrier layer on the first material layer;

a second material layer between the first material layer and the barrier layer to prevent hydrogen from diffusing from the first material layer into the barrier layer, the second material layer including a metal oxide; and

a display layer on the barrier layer.

12. The flexible display apparatus as claimed in claim 11, further comprising a flexible substrate between the second material layer and the barrier layer.

13. The flexible display apparatus as claimed in claim 11, wherein the metal oxide includes Al₂O₃.