Semiconductor device
First Claim
1. A semiconductor device comprising:
- an insulating layer including a first region;
an oxide semiconductor layer over the insulating layer, the oxide semiconductor layer including a second region;
a source electrode layer electrically connected to the oxide semiconductor layer;
a drain electrode layer electrically connected to the oxide semiconductor layer; and
a gate insulating layer over the oxide semiconductor layer,wherein;
the oxide semiconductor layer contains indium, zinc and a metal other than indium and zinc;
the first region is in direct contact with the second region; and
a concentration of hydrogen in a part of the insulating layer is greater than zero and less than 6×
1020 atoms/cm3.
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Accused Products
Abstract
In a transistor having a top-gate structure in which a gate electrode layer overlaps with an oxide semiconductor layer which faints a channel region with a gate insulating layer interposed therebetween, when a large amount of hydrogen is contained in the insulating layer, hydrogen is diffused into the oxide semiconductor layer because the insulating layer is in contact with the oxide semiconductor layer; thus, electric characteristics of the transistor are degraded. An object is to provide a semiconductor device having favorable electric characteristics. An insulating layer in which the concentration of hydrogen is less than 6×1020 atoms/cm3 is used for the insulating layer being in contact with oxide semiconductor layer which forms the channel region. Using the insulating layer, diffusion of hydrogen can be prevented and a semiconductor device having favorable electric characteristics can be provided.
144 Citations
22 Claims
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1. A semiconductor device comprising:
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an insulating layer including a first region; an oxide semiconductor layer over the insulating layer, the oxide semiconductor layer including a second region; a source electrode layer electrically connected to the oxide semiconductor layer; a drain electrode layer electrically connected to the oxide semiconductor layer; and a gate insulating layer over the oxide semiconductor layer, wherein; the oxide semiconductor layer contains indium, zinc and a metal other than indium and zinc; the first region is in direct contact with the second region; and a concentration of hydrogen in a part of the insulating layer is greater than zero and less than 6×
1020 atoms/cm3. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A semiconductor device comprising:
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an insulating layer including a first region; an oxide semiconductor layer over the insulating layer, the oxide semiconductor layer including a second region; a source electrode layer electrically connected to the oxide semiconductor layer; a drain electrode layer electrically connected to the oxide semiconductor layer; and a gate insulating layer over the oxide semiconductor layer, wherein; the oxide semiconductor layer includes a crystal portion; the first region is in direct contact with the second region; and a concentration of hydrogen in a part of the insulating layer is greater than zero and less than 6 ×
1020 atoms/cm3. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A semiconductor device comprising:
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a first insulating layer; a second insulating layer over the first insulating layer, the second insulating layer including a first region; an oxide semiconductor layer over the second insulating layer, the oxide semiconductor layer including a second region; a source electrode layer electrically connected to the oxide semiconductor layer; a drain electrode layer electrically connected to the oxide semiconductor layer; and a gate insulating layer over the oxide semiconductor layer, wherein; the first insulating layer contains silicon and nitrogen; the second insulating layer contains silicon and oxygen; the first region is in direct contact with the second region; and a concentration of hydrogen in a part of the second insulating layer is greater than zero and less than 6 ×
1020 atoms/cm3. - View Dependent Claims (17, 18, 19, 20, 21, 22)
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Specification