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Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery

  • US 9,447,499 B2
  • Filed: 06/22/2012
  • Issued: 09/20/2016
  • Est. Priority Date: 06/22/2012
  • Status: Active Grant
First Claim
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1. A faceplate for use in semiconductor processing showerhead, the faceplate comprising:

  • a volume with an outer surface, a top surface, a bottom surface, and a center axis, wherein the top surface and the bottom surface;

    partially bound the volume,are substantially parallel to, and offset from, each other, andare substantially centered on, and normal to, the center axis, andwherein the outer surface at least partially bounds the volume in a radial direction with respect to the center axis;

    a plurality of first channels within the volume extending from the outer surface towards the center axis, each first channel having a first end closer to the center axis than a second end of that first channel;

    a plurality of first gas distribution holes, each first gas distribution hole fluidly connected within the volume to one or more of the first channels and extending through the bottom surface and not extending through the top surface;

    a plurality of second gas distribution holes, each second gas distribution hole extending through the top surface and the bottom surface and not fluidly connected within the volume to the first channels; and

    one or more gas distribution channels fluidically connected with the second ends of the plurality of first channels, following a path around substantially all of the second gas distribution holes and around all of the second ends of the first channels, and configured to be fluidically connected with one or more gas feed inlets.

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