Semiconductor analysis microchip and method of manufacturing the same

• US 9,448,153 B2
• Filed: 08/28/2013
• Issued: 09/20/2016
• Est. Priority Date: 03/07/2013
• Status: Active Grant

• Current Assignee: Aipore, Inc.
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Kobayashi, Kentaro, Furuyama, Hideto
• Primary Examiner(s): Dang, Trung Q
• Assistant Examiner(s): REDDINGTON, PATRICIA D
• Application Number:
  US14/012,599
• Publication Number:
  US 20140252505A1
• Time in Patent Office: 1,119 Days
• Field of Search: 257/414
• US Class Current: 1/1
• CPC Class Codes: B01L 2300/0681 Filter
• CPC Class Codes: B01L 2400/0421 electrophoretic flow
• CPC Class Codes: B01L 2400/086 using baffles or other fixed flow obstructions
• CPC Class Codes: B01L 3/502707 characterised by the manufacture of the container or its components by shaping or joining plastic parts B29C59/00, B29C65/00; by laminating B32B37/00; manufacture of microstructural devices in general B81C
• CPC Class Codes: B01L 3/502753 characterised by bulk separation arrangements on lab-on-a-chip devices, e.g. for filtration or centrifugation separation in general B01D; microapparatus for analysis using electrophoresis G01N27/44791; sample preparation G01N1/28
• CPC Class Codes: G01N 15/01 specially adapted for biological cells, e.g. blood cells investigating sedimentation of particle suspensions in blood G01N15/05
• CPC Class Codes: G01N 15/0606 by collecting particles on a support
• CPC Class Codes: G01N 15/0656 using electric, e.g. electrostatic methods or magnetic methods by investigating individual particles G01N15/1031, G01N15/12
• CPC Class Codes: G01N 27/44791 Microapparatus sample containers with integrated microfluidic structures B01L3/5027
• CPC Class Codes: G01N 33/48721 Investigating individual macromolecules, e.g. by translocation through nanopores Coulter counters in general G01N15/12; fabrication methods for nanoscale apertures B81B1/00; sequencing of nucleic acids C12Q1/68

Abstract

According to one embodiment, a semiconductor analysis microchip configured to detect a fine particle in a sample liquid, including a semiconductor substrate, a first flow channel provided in the semiconductor substrate, to which the sample liquid is introduced, and a pore provided in the first flow channel and configured to pass the fine particle in the sample liquid.

Claims

1. A semiconductor analysis microchip configured to detect a fine particle in a sample liquid, comprising:

a semiconductor substrate;

a first flow channel provided between a first insulating film and a second insulating film in the semiconductor substrate, into which the sample liquid is introduced, the first flow channel including a groove provided in the semiconductor substrate, the first insulating film being in direct contact with a bottom surface and side surfaces of the groove, and the second insulating film putting a lid on at least part of the groove;

a second flow channel provided above the first flow channel, the second flow channel including a third insulating film at least partially stacked on the second insulating film; and

a pore provided in the second insulating film between the first flow channel and the second flow channel to allow the fine particle in the sample liquid to pass therethrough, wherein the pore is not provided in the first insulating film.

2. The microchip according to claim 1, wherein the first insulating film comprises a silicon oxide film.

3. The microchip according to claim 1, wherein the second insulating film comprises a silicon nitride film.

4. The microchip according to claim 1, wherein the third insulating film comprises a silicon oxide film.

5. The microchip according to claim 1, wherein a thickness of the semiconductor substrate is greater than a thickness of the second insulating film.

8. The microchip according to claim 1, wherein the first insulating film and the second insulating film are of different materials.

6. A semiconductor analysis microchip configured to detect a fine particle in a sample liquid, comprising:

a semiconductor substrate;

a first flow channel provided in the semiconductor substrate, into which the sample liquid is introduced, the first flow channel including a groove provided in the semiconductor substrate, and a first insulating film putting a lid on at least part of the groove;

a second flow channel provided above the first flow channel, the second flow channel including a second insulating film at least partially stacked on the first insulating film and having a groove pattern, and a third insulating film putting a lid on at least part of the groove pattern of the second insulating film; and

a pore provided in the first insulating film between the first flow channel and the second flow channel to allow the fine particle in the sample liquid to pass therethrough, wherein the pore is not provided in the second insulating film.

7. The microchip according to claim 6, wherein the second flow channel is provided between the first insulating film and the third insulating film.

9. The microchip according to claim 6, further comprising a liquid inlet which penetrates the first insulating film, the second insulating film, and the third insulating film.