Systems and devices including multi-transistor cells and methods of using, making, and operating the same
First Claim
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1. A device, comprising:
- a plurality of data cells, wherein each data cell comprises;
a first transistor comprising;
a column gate; and
a first channel;
a second transistor comprising;
a row gate, wherein the row gate crosses over the column gate, under the column gate, or both;
a source disposed near a distal end of a first leg;
a drain disposed near a distal end of a second leg, wherein the column gate extends between the first leg and the second leg;
a second channel, wherein the second channel of the second transistor is connected to the first channel of the first transistor; and
a data element connected to the source or the drain.
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Abstract
A device may include a first transistor, a second transistor, and a data element. The first transistor may have a column gate and a channel, and the second transistor may include a row gate that crosses over the column gate, under the column gate, or both. The second transistor may also include another channel, a source disposed near a distal end of a first leg, and a drain disposed near a distal end of a second leg. The column gate may extend between the first leg and the second leg. The channel of the second transistor may be connected to the channel of the first transistor, and the data element may be connected to the source or the drain. Methods, systems, and other devices are contemplated.
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Citations
18 Claims
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1. A device, comprising:
a plurality of data cells, wherein each data cell comprises; a first transistor comprising; a column gate; and a first channel; a second transistor comprising; a row gate, wherein the row gate crosses over the column gate, under the column gate, or both; a source disposed near a distal end of a first leg; a drain disposed near a distal end of a second leg, wherein the column gate extends between the first leg and the second leg; a second channel, wherein the second channel of the second transistor is connected to the first channel of the first transistor; and a data element connected to the source or the drain. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method, comprising:
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forming a first gate in a trench; after forming the first gate in the trench, forming a plurality of laterally spaced and longitudinally elongated fins individually extending generally perpendicular to the first gate; and forming a second gate that crosses over the first gate. - View Dependent Claims (8, 9, 10, 11)
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12. A method, comprising:
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forming a pair of laterally spaced and immediately laterally adjacent isolation trenches in a substrate; forming a first gate disposed between the pair of isolation trenches and laterally outward of each isolation trench of the pair of isolation trenches; forming a longitudinally elongated opening that crosses over the first gate and the pair of isolation trenches; and forming two second gates within the opening and which cross over the first gate and the pair of isolation trenches. - View Dependent Claims (13, 14)
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15. A method, comprising:
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forming a pair of laterally spaced and immediately laterally adjacent isolation trenches in a substrate; forming a first gate disposed between the pair of isolation trenches and laterally outward of each isolation trench of the pair of isolation trenches; and forming a second gate overlapping the first gate and the pair of isolation trenches, the forming of the second gate comprising a sidewall spacer process whereby conductive material is deposited over sidewalls and laterally all across a base of an opening followed by anisotropic etching of the conductive material to remove some of the conductive material from being over the base of the opening. - View Dependent Claims (16, 17)
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18. A method, comprising:
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forming a pair of laterally spaced and immediately laterally adjacent isolation trenches in a substrate; forming a first gate disposed between the pair of isolation trenches and laterally outward of each isolation trench of the pair of isolation trenches; and
;forming a second gate that crosses over the first gate and the pair of isolation trenches, the second gate having a conductive elevationally innermost surface that is lower than a conductive elevationally outermost surface of the first gate.
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Specification