Liquid crystal display device and manufacturing method of liquid crystal display device
First Claim
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1. A manufacturing method of a liquid crystal display device, comprising the steps of:
- forming a first conductive layer over an insulating surface;
forming a first insulating layer and a second insulating layer over the first conductive layer; and
etching the first conductive layer with a first dry etching using the first insulating layer and the second insulating layer as masks, thereby a second conductive layer on a bottom surface and a side surface of the first insulating layer and a third conductive layer on a bottom surface and a side surface of the second insulating layer are formed,wherein, the second conductive layer remains on the bottom surface and the side surface of the first insulating layer in the liquid crystal display device, andwherein, the third conductive layer remains on the bottom surface and the side surface of the second insulating layer in the liquid crystal display device,wherein, in the etching step, at least one of a conductive material for forming the first conductive layer, and a reaction product of the conductive material and a gas used for the first dry etching, is deposited on the side surface of the first insulating layer and the side surface of the second insulating layer.
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Abstract
A horizontal electric field mode liquid crystal display device having a novel electrode structure, and a manufacturing method thereof are provided. The liquid crystal display device includes a first substrate having an insulating surface; a first conductive film and a second conductive film over the insulating surface; a first insulating film over the first conductive film; a second insulating film over the second conductive film; a second substrate facing the first substrate; and a liquid crystal layer positioned between the first substrate and the second substrate. Part of the first conductive film exists also on a side portion of the first insulating film, and part of the second conductive film exists also on a side portion of the second insulating film. The liquid crystal layer includes liquid crystal exhibiting a blue phase.
26 Citations
12 Claims
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1. A manufacturing method of a liquid crystal display device, comprising the steps of:
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forming a first conductive layer over an insulating surface; forming a first insulating layer and a second insulating layer over the first conductive layer; and etching the first conductive layer with a first dry etching using the first insulating layer and the second insulating layer as masks, thereby a second conductive layer on a bottom surface and a side surface of the first insulating layer and a third conductive layer on a bottom surface and a side surface of the second insulating layer are formed, wherein, the second conductive layer remains on the bottom surface and the side surface of the first insulating layer in the liquid crystal display device, and wherein, the third conductive layer remains on the bottom surface and the side surface of the second insulating layer in the liquid crystal display device, wherein, in the etching step, at least one of a conductive material for forming the first conductive layer, and a reaction product of the conductive material and a gas used for the first dry etching, is deposited on the side surface of the first insulating layer and the side surface of the second insulating layer. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A manufacturing method of a liquid crystal display device, comprising the steps of:
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forming a first conductive layer over an insulating surface; forming a first insulating layer and a second insulating layer over the first conductive layer; and etching the first conductive layer with a first dry etching using the first insulating layer and the second insulating layer as masks, thereby a second conductive layer on a bottom surface and a side surface of the first insulating layer and a third conductive layer on a bottom surface and a side surface of the second insulating layer are formed, wherein, the second conductive layer remains on the bottom surface and the side surface of the first insulating layer in the liquid crystal display device, and wherein, the third conductive layer remains on the bottom surface and the side surface of the second insulating layer in the liquid crystal display device, wherein, in the etching step, a conductive material for forming the first conductive layer, and a reaction product of the conductive material and a gas used for the first dry etching, are deposited on the side surface of the first insulating layer and the side surface of the second insulating layer. - View Dependent Claims (8, 9, 10, 11, 12)
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Specification
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Current AssigneeSemiconductor Energy Laboratory Co., Ltd.
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Original AssigneeSemiconductor Energy Laboratory Co., Ltd.
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InventorsMiyairi, Hidekazu, Ishitani, Tetsuji, Kubota, Daisuke, Sasagawa, Shinya
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Primary Examiner(s)Won, Bumsuk
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Assistant Examiner(s)LAU, EDMOND C
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Application NumberUS13/416,077Publication NumberTime in Patent Office1,663 DaysField of Search349/139US Class Current1/1CPC Class CodesC09K 19/0275 Blue phaseG02F 1/134363 for applying an electric fi...G02F 1/1362 Active matrix addressed cel...
