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Photochemical methods and photoactive compounds for modifying surfaces

  • US 9,454,077 B2
  • Filed: 01/05/2015
  • Issued: 09/27/2016
  • Est. Priority Date: 11/09/2005
  • Status: Expired due to Fees
First Claim
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1. A method for forming a dewetting-resistant surface, the method comprising:

  • depositing a molecule to at least a part of the surface, wherein the molecule is a polymer selected from the group consisting of polystyrene, polyether, polyester, polyamide, polyvinyl, polysaccharide, and mixtures thereof;

    depositing a photoactive compound which comprises a compound of formula (I)

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