Photochemical methods and photoactive compounds for modifying surfaces
First Claim
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1. A method for forming a dewetting-resistant surface, the method comprising:
- depositing a molecule to at least a part of the surface, wherein the molecule is a polymer selected from the group consisting of polystyrene, polyether, polyester, polyamide, polyvinyl, polysaccharide, and mixtures thereof;
depositing a photoactive compound which comprises a compound of formula (I)
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Abstract
Compounds and methods for controlling the surface properties are described. Compounds of the invention can form radicals upon exposure to irradiation, which can then react with nearby molecules to alter the surface properties of various substrates. The invention can provide surfaces that are resistant to dewetting, surfaces that have immobilized molecules such as carbohydrates and polymers immobilized, and surfaces that have metals deposited on the surface. The invention can be utilized in a wide range of application, such as sensors, microreactors, microarrays, electroless deposition of metals, and the like.
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Citations
13 Claims
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1. A method for forming a dewetting-resistant surface, the method comprising:
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depositing a molecule to at least a part of the surface, wherein the molecule is a polymer selected from the group consisting of polystyrene, polyether, polyester, polyamide, polyvinyl, polysaccharide, and mixtures thereof; depositing a photoactive compound which comprises a compound of formula (I) - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification