Adjustment of power and frequency based on three or more states
First Claim
1. A plasma processing system, comprising,a primary generator including three primary power controllers, each of the primary power controllers configured with a predefined power setting;
- a secondary generator including three secondary power controllers, each of the secondary power controllers configured with a predefined power setting; and
a control circuit interfaced as an input to each of the primary and secondary generators, the control circuit configured to generate a pulsed signal, the pulsed signal defined to include three states that define a cycle that repeats during operation for a plurality of cycles, each state defined to select a first, or a second, or a third of the three primary power controllers while also selecting a first, or a second, or a third of the three secondary power controllers.
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Accused Products
Abstract
Systems and methods for adjusting power and frequency based on three or more states are described. One of the methods includes receiving a pulsed signal having multiple states. The pulsed signal is received by multiple radio frequency (RF) generators. When the pulsed signal having a first state is received, an RF signal having a pre-set power level is generated by a first RF generator and an RF signal having a pre-set power level is generated by a second RF generator. Moreover, when the pulsed signal having a second state is received, RF signals having pre-set power levels are generated by the first and second RF generators. Furthermore, when the pulsed signal having a third state is received, RF signals having pre-set power levels are generated by the first and second RF generators.
155 Citations
15 Claims
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1. A plasma processing system, comprising,
a primary generator including three primary power controllers, each of the primary power controllers configured with a predefined power setting; -
a secondary generator including three secondary power controllers, each of the secondary power controllers configured with a predefined power setting; and a control circuit interfaced as an input to each of the primary and secondary generators, the control circuit configured to generate a pulsed signal, the pulsed signal defined to include three states that define a cycle that repeats during operation for a plurality of cycles, each state defined to select a first, or a second, or a third of the three primary power controllers while also selecting a first, or a second, or a third of the three secondary power controllers. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A plasma system configured for operation using multiple states, the plasma system comprising:
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a primary radio frequency (RF) generator for receiving a pulsed signal, the pulsed signal having three or more states, the three or more states including a first state, a second state, and a third state, the primary RF generator for coupling to a plasma chamber via an impedance matching circuit, a secondary RF generator for receiving the pulsed signal, the secondary RF generator for coupling to the plasma chamber via the impedance matching circuit, each of the primary RF generator and the secondary RF generator has a controller that is configured to determine whether the pulsed signal is in the first state, or the second state, or the third state, the primary RF generator'"'"'s controller is configured to determine that the pulsed signal is in the first state, and in response, controls the primary RF generator to provide an RF signal having a first primary quantitative level to the impedance matching circuit, the secondary RF generator'"'"'s controller is configured to determine that the pulsed signal is in the first state, and in response, controls the secondary RF generator to provide an RF signal having a first secondary quantitative level to the impedance matching circuit, the primary RF generator'"'"'s controller is configured to determine that the pulsed signal is in the second state, and in response, controls the primary RF generator to provide an RF signal having the first primary quantitative level to the impedance matching circuit, the secondary RF generator'"'"'s controller is configured to determine that the pulsed signal is in the second state, and in response, controls the secondary RF generator to provide an RF signal having a second secondary quantitative level to the impedance matching circuit, the primary RF generator'"'"'s controller is configured to determine that the pulsed signal is in the third state, and in response, controls the primary RF generator to provide an RF signal having a second primary quantitative level to the impedance matching circuit, the secondary RF generator'"'"'s controller is configured to determine that the pulsed signal is in the third state, and in response, controls the secondary RF generator to provide an RF signal having a third secondary quantitative level to the impedance matching circuit. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15)
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Specification