Conductive film with high transmittance having a number of anti reflection coatings, touch panel using the same and manufacturing method thereof

• US 9,468,088 B2
• Filed: 06/22/2011
• Issued: 10/11/2016
• Est. Priority Date: 06/22/2010
• Status: Expired due to Fees

• Current Assignee: LG Innotek Company Limited (LG Corporation)
• Original Assignee: LG Innotek Company Limited (LG Corporation)
• Inventors: Nah, Hyunmin
• Primary Examiner(s): Willis, Tremesha S
• Application Number:
  US13/703,775
• Publication Number:
  US 20130087374A1
• Time in Patent Office: 1,938 Days
• Field of Search: 174/258, 174/250, 174/251, 174/253, 174/255, 174/256, 174/257
• US Class Current: 1/1
• CPC Class Codes: G06F 3/0443 using a single layer of sensing electrodes
• CPC Class Codes: G06F 3/0445 using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
• CPC Class Codes: G06F 3/045 using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
• CPC Class Codes: H05K 1/0213 Electrical arrangements not otherwise provided for
• CPC Class Codes: H05K 3/0011 Working of insulating substrates or insulating layers

Abstract

The present invention relates to a conductive film with high transmittance and having a number of anti reflection (AR) coated films, whereby transmittance of an ITO film can be improved by coating the number of anti reflection (AR) coating having a high refractivity and lower refractivity on the conductive film, and the present invention according to an exemplary embodiment can be advantageously applied to a touch panel of an ITO film/ITO film combination to obtain a clear image due to sufficient transmittance, wherein an exemplary embodiment of the present invention includes a conductive film formed with a transparent electrode pattern, and a number of anti reflection (AR) films formed on at least one surface of the conductive film to prevent optical reflection.

Claims

1. A conductive film comprising:

a film;

a transparent electrode pattern on a surface of the film; and

a plurality of anti-reflection (AR) films on at least one surface of the film,

wherein the plurality of AR films includes;

a first Al2O3 film on the at least one surface of the film,

a first titanium dioxide film on the first Al2O3 film,

a second Al2O3 film on the first titanium dioxide film,

a second titanium dioxide film on the second Al2O3 film, and

a third Al2O3 film on the second titanium dioxide film, and

wherein the first Al2O3 film has a thickness in a range of 970 Å

to 1030 Å

, the first titanium dioxide film has a thickness in a range of 220 Å

to 260 Å

, the second Al2O3 film has a thickness in a range of 190 Å

to 230 Å

, the second titanium dioxide film has a thickness in a range of 550 Å

to 610 Å

, and the third Al2O3 film has a thickness in a range of 760 Å

to 820 Å

.

3. The conductive film of claim 1, wherein the first Al2O3 film has a relative refractive index to air of the first Al2O3 film is in a range of 1.4 to 2.1.

4. The conductive film of claim 1, wherein the plurality of AR films inhibits reflection of light having a wavelength in a range of 450 nm to 650 nm.

14. A touch panel comprising:

the conductive film of claim 1; and

an optical clear adhesive (OCA) film on the plurality of AR films or on a surface of the film other than the surface of the film that the plurality of AR films is disposed on.

2. A conductive film comprising:

a film;

a transparent electrode pattern on a surface of the film; and

a plurality of AR films on at least one surface of the film,

wherein the plurality of AR films includes;

a base film on the at least one surface of the film, the base film including any one of silicon monoxide and silicon dioxide,

a first titanium dioxide film on the base film,

a first silicon dioxide film on the first titanium dioxide film,

a second titanium dioxide film on the first silicon dioxide film, and

a second silicon dioxide film on the second titanium dioxide, and

wherein, in the case where if the base film includes silicon monoxide, the thickness of the base film is has a thickness in a range of 110 Å

to 140 Å

, the thickness of the first titanium dioxide film is has a thickness in a range of 190 Å

to 230 Å

, the thickness of the first silicon dioxide film is has a thickness in a range of 130 Å

to 210 Å

, the thickness of the second titanium dioxide film is has a thickness in a range of 730 Å

to 870 Å

, and the thickness of the second silicon dioxide film is has a thickness in a range of 890 Å

to 1010 Å

, and

wherein, in the case where if the base film includes silicon dioxide, the thickness of the base film is has a thickness in a range of 1590 Å

to 1670 Å

, the thickness of the first titanium dioxide film is has a thickness in a range of 130 Å

to 170 Å

, the thickness of the first silicon dioxide film is has a thickness in a range of 330 Å

to 380 Å

, the thickness of the second titanium dioxide film is has a thickness in a range of 1190 Å

to 1210 Å

, and the thickness of the second silicon dioxide film is has a thickness in a range of 960 Å

to 980 Å

.

5. A touch panel comprising:

the conductive film of claim 2; and

an optical clear adhesive (OCA) film on the plurality of AR films or on a surface of the film other than the surface of the film that the plurality of AR films is disposed on.

6. The touch panel of claim 5, wherein the OCA film includes a pressure-sensitive adhesive.

7. The touch panel of claim 5, wherein the film having the transparent electrode pattern formed thereon includes a first film and a second film facing the first film,

wherein the transparent electrode pattern includes a first pattern on the first film and a second pattern on the second film, and

wherein the first and second patterns face each other.

8. The touch panel of claim 7, wherein an air gap is formed between the first film and the second film.

9. The touch panel of claim 8, further comprising:

a spacer between the first and second films to allow the first and second films to be fused.

10. The touch panel of claim 8, further comprising:

a plurality of dot spacers on the first film or the second film.

11. The conductive film of claim 2, wherein the base film has a relative refractive index to air in a range of 1.4 to 2.1.

12. The touch panel of claim 5, wherein the base film has a relative refractive index to air in a range of 1.4 to 2.1.

13. A touch panel comprising:

a film;

a transparent electrode pattern on the film;

a base film coated on one surface of the film;

a plurality of AR films sequentially formed on the base film; and

an OCA film on the plurality of AR films or on another surface of the film;

wherein the base film includes any one of silicon monoxide and silicon dioxide and directly contacts the transparent electrode pattern,

wherein the plurality of AR films includes a first titanium dioxide film, first silicon dioxide film, a second titanium dioxide film, and a second silicon dioxide film;

wherein, if the base film includes silicon monoxide, the base film has a thickness in a range of 110 Å

to 140 Å

, the first titanium dioxide film has a thickness in a range of 190 Å

to 230 Å

, the first silicon dioxide film has a thickness in a range of 130 Å

to 210 Å

, the second titanium dioxide film has a thickness in a range of 730 Å

to 870 Å

, and the second silicon dioxide film has a thickness in a range of 890 Å

to 1010 Å

; and

wherein, if the base film includes silicon dioxide, the base film has a thickness in a range of 1590 Å

to 1670 Å

, the first titanium dioxide film has a thickness in a range of 130 Å

to 170 Å

, the first silicon dioxide film has a thickness in a range of 330 Å

to 380 Å

, the second titanium dioxide film has a thickness in a range of 1190 Å

to 1210 Å

, and the second silicon dioxide film has a thickness in a range of 960 Å

to 980 Å

.