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Hot tile sputtering system

  • US 9,476,117 B2
  • Filed: 03/14/2014
  • Issued: 10/25/2016
  • Est. Priority Date: 04/07/2009
  • Status: Active Grant
First Claim
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1. A method of sputter coating a glass substrate, said method comprising:

  • providing a glass substrate;

    providing a sputtering assembly for sputtering a coating material onto said glass substrate in a vacuum deposition chamber, wherein said sputtering assembly comprises a backing plate and a separating element disposed on said backing plate;

    providing at least one target element and disposing said at least one target element at and in contact with a surface of said separating element, wherein said at least one target element is not bonded to said separating element when disposed at and in contact with said surface of said separating element;

    providing an expansion gap at or adjacent to said at least one target element to allow for expansion of said at least one target element during the sputtering process;

    sputtering coating material from said at least one target element;

    heating said at least one target element to at least about 400 degrees C. during the step of sputtering coating material; and

    wherein the step of sputtering coating material comprises sputtering coating material onto a surface of said glass substrate in the vacuum deposition chamber to coat said surface of said glass substrate with a layer of the coating material.

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