Lithographic apparatus and device manufacturing method

• US 9,482,966 B2
• Filed: 09/13/2012
• Issued: 11/01/2016
• Est. Priority Date: 11/12/2002
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Bijlaart, Erik Theodorus Maria, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ritsema, Roelof Aeilko Siebrand, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Streefkerk, Bob
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US13/615,190
• Publication Number:
  US 20130250270A1
• Time in Patent Office: 1,510 Days
• Field of Search: 355/30, 355/53, 355/77, 355/72, 355/75, 355/55
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Claims

1. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of the substrate, an object positioned on the substrate table, or both, and

a vacuum port to provide vacuum to a gap between the edge seal member and the substrate, the object, or both, the vacuum port positioned on a side of the gap opposite the projection system; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both and to confine the liquid essentially to a localized area on the substrate table smaller than an area of the substrate.

2. An apparatus according to claim 1, wherein the substrate table further comprises a channel positioned radially inwardly of the vacuum port, the channel being connected to a gas source such that on actuation of the vacuum a flow of gas radially outwardly from the channel towards the vacuum can be established.

3. An apparatus according to claim 2, wherein one or more burls configured to be in contact with the substrate, the object, or both, are present radially outwardly of the channel and inwardly of the vacuum port.

4. An apparatus according to claim 1, wherein the substrate table comprises a portion which extends below the the substrate, the object, or both, and is radially outwardly of the vacuum port.

5. An apparatus according to claim 4, wherein the portion has one or more parts which extend up to at least partly support the substrate, the object, or both.

6. An apparatus according to claim 4, wherein the portion is part of a pimple table configured to support the substrate.

7. An apparatus according to claim 1, further comprising a compartment in the substrate table in fluid connection with the gap via the vacuum port and in fluid connection with the vacuum.

8. An apparatus according to claim 1, wherein the vacuum port is annular.

9. An apparatus according to claim 1, wherein the vacuum port is discontinuous.

10. An apparatus according to claim 1, wherein the vacuum port is continuous.

11. An apparatus according to claim 1, wherein the vacuum port is positioned adjacent an edge portion of the edge seal member.

12. An apparatus according to claim 1, wherein an object is positioned on the substrate table and wherein the object comprises a sensor system component.

13. An apparatus according to claim 1, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

14. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of a substrate, an object, or both, positioned on the substrate table and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the substrate, the object, or both, and

a port to drain liquid entering a gap between the edge seal member and the substrate, the object, or both, the port positioned on a side of the gap opposite the projection system; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the said-projection system and the substrate, the object, or both, and to confine the liquid essentially to a localized area on the substrate table smaller than an area of the substrate.

15. An apparatus according to claim 14, wherein the edge seal member and the substrate, the object, or both, are moveably mounted relative to one another.

16. An apparatus according to claim 14, wherein the edge seal member is moveable in a plane substantially parallel to the primary surface of the edge seal member to vary the distance between the edge seal member and the substrate, the object, or both.

17. An apparatus according to claim 14, wherein the substrate table comprises an actuator configured to move the edge seal member relative to a remainder of the substrate table in a direction substantially parallel to the optical axis of the apparatus.

18. An apparatus according to claim 14, wherein the substrate table comprises a hydrophobic layer adjacent an edge portion of the edge seal member and the substrate, the object, or both, and located at an opposite side, to the projection system, of the edge seal member and the substrate, the object, or both.

19. An apparatus according to claim 18, wherein the liquid has a contact angle of greater than 90°

with the hydrophobic layer.

20. An apparatus according to claim 14, wherein the edge seal member has a projection with a top surface co-planar with the primary surface of the edge seal member and extending towards the optical axis of the apparatus.

21. An apparatus according to claim 14, wherein the substrate table comprises a gap seal member configured to abut or at least partly overlap, in the direction of the optical axis, both the edge seal member and the substrate, the object, or both.

22. An apparatus according to claim 21, wherein the gap seal member is configured to be in contact with the primary surfaces thereby spanning a gap between the edge seal member and the substrate, the object, or both.

23. An apparatus according to claim 21, wherein the gap seal member has inner and outer edges at least one of which edges is tapered such that the distance of the surface of the gap seal member facing away from the primary surface of the edge seal member or the substrate, the object, or both, decreases towards the edge of the gap seal member.

24. An apparatus according to claim 21, wherein the substrate table comprises a vacuum port in the primary surface of the edge seal member configured to hold the gap seal member in place.

25. An apparatus according to claim 14, wherein the substrate table comprises an actuator configured to vary the distance of the primary surface of the substrate, the object, or both, relative to the remainder of the substrate table.

26. An apparatus according to claim 14, wherein an object is positioned on the substrate table and wherein the object comprises a sensor system component.

27. An apparatus according to claim 14, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

28. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a photosensitive substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of a substrate, an object, or both, positioned on the substrate table and configured to provide an upward-facing primary surface substantially co-planar with a primary surface of the substrate, the object, or both, and

a further edge seal member configured to extend across a gap between the edge seal member and the substrate, the object, or both, and to be in contact with the substrate, the object, or both, wherein the further edge seal member is movable relative to the edge seal member; and

a liquid supply system configured provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

29. An apparatus according to claim 28, wherein the further edge seal member is flexible.

30. An apparatus according to claim 29, wherein the flexible further edge seal member is attached to the edge seal member.

31. An apparatus according to claim 29, wherein the flexible further edge seal member has a port, connected to a vacuum source, adjacent its end distal from the edge seal member, such that on actuation of the vacuum source, the flexible further edge seal member is deflectable upwards to contact against the substrate, the object, or both, to form a seal between the flexible further edge seal member and the substrate, the object, or both, due to the force generated by the vacuum source acting on the substrate, the object, or both.

32. An apparatus according to claim 29, further comprising a second flexible further edge seal member attached under the substrate, the object, or both, to the substrate table and with a free end radially outwardly from the attachment point.

33. An apparatus according to claim 28, wherein the further edge seal member is effective to apply a force to the substrate, the object, or both, away from the substrate table when the substrate, the object, or both, is held on the substrate table.

34. An apparatus according to claim 28, wherein an object is positioned on the substrate table and wherein the object comprises a sensor system component.

35. An apparatus according to claim 28, wherein the edge seal member, the further edge seal member, or both, is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

36. A device manufacturing method comprising:

providing a liquid, using a liquid supply system, in a space between a projection system and a substrate supported on a substrate table, the substrate table comprising;

an edge seal member at least partly surrounding an edge of the substrate,

an object positioned on the substrate table, or both, and

a vacuum port;

confining the liquid essentially to a localized area on the substrate table smaller than an area of the substrate;

projecting a patterned beam, using the projection beam and through the liquid, onto a target portion of the substrate supported by the substrate table; and

providing vacuum, using the vacuum port, to a gap between the edge seal member and the substrate, the object, or both, the vacuum port positioned on a side of the gap opposite the projection system.

37. A method according to claim 36, wherein the substrate table further comprises a channel positioned radially inwardly of the vacuum port, the channel connected to a gas source, and on actuation of the vacuum, establishing a flow of gas radially outwardly from the channel towards the vacuum.

38. A method according to claim 37, further comprising contacting the substrate, the object, or both, with one or more burls present radially outwardly of the channel and inwardly of the vacuum port.

39. A method according to claim 36, wherein the substrate table comprises a portion which extends below the substrate, the object, or both, and is radially outwardly of the vacuum port.

40. A method according to claim 39, further comprising at least partly supporting the substrate, the object, or both, using one or more parts of the portion which extend up to the substrate, the object, or both.

41. A method according to claim 39, wherein the portion is part of a pimple table supporting the substrate.

42. A method according to claim 36, further comprising providing fluid connection of a compartment in the substrate table with the gap via the vacuum port and providing fluid connection of the compartment in the substrate table with the vacuum.

43. A method according to claim 36, wherein the vacuum port is annular.

44. A method according to claim 36, wherein the vacuum port is discontinuous.

45. A method according to claim 36, wherein the vacuum port is continuous.

46. A method according to claim 36, wherein the vacuum port is positioned adjacent an edge portion of the edge seal member.

47. A method according to claim 36, wherein an object is positioned on the substrate table and the object comprises a sensor system component.

48. A method according to claim 36, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

49. A device manufacturing method comprising:

providing a liquid, using a liquid supply system, in a space between a projection system and a substrate supported on a substrate table, the substrate table comprising;

an edge seal member at least partly surrounding an edge of the substrate, an object positioned on the substrate table, or both, the edge seal member providing a primary surface facing the projection system substantially co-planar with a primary surface of the substrate, the object, or both, and

a port;

confining the liquid essentially to a localized area on the substrate table smaller than an area of the substrate;

projecting a patterned beam, using the projection beam and through the liquid, onto a target portion of the substrate supported by the substrate table; and

draining, using the port, liquid entering a gap between the edge seal member and the substrate, the object, or both, the port positioned on a side of the gap opposite the protection system.

50. A method according to claim 49, wherein the edge seal member and the substrate, the object, or both, are moveably mounted relative to one another.

51. A method according to claim 49, further comprising moving the edge seal member in a plane substantially parallel to the primary surface of the edge seal member to vary the distance between the edge seal member and the substrate, the object, or both.

52. A method according to claim 49, further comprising moving the edge seal member relative to a remainder of the substrate table in a direction substantially parallel to the optical axis of the apparatus using actuator of the substrate table.

53. A method according to claim 52, wherein the actuator comprises a wedge member and further comprising moving the edge seal member relative to a remainder of the substrate table in the direction substantially parallel to the optical axis of the apparatus by movement of the wedge member in a direction substantially parallel to the primary surface of the edge seal member.

54. A method according to claim 53, further comprising locking the wedge in place on removal of an actuation force by virtue of the coefficient of friction of the wedge.

55. A method according to claim 49, further comprising repelling liquid using a hydrophobic layer of the substrate table, the layer adjacent an edge portion of the edge seal member and the substrate, the object, or both, and located at an opposite side, to the projection system, of the edge seal member and the substrate, the object, or both.

56. A method according to claim 55, wherein the liquid has a contact angle of greater than 90°

with the hydrophobic layer.

57. A method according to claim 49, wherein the edge seal member has a projection with a top surface co-planar with the primary surface of the edge seal member and extending towards the optical axis of the apparatus.

58. A method according to claim 49, further comprising abutting or at least partly overlapping, in the direction of the optical axis, both the edge seal member and the substrate, the object, or both, using a gap seal member.

59. A method according to claim 58, wherein the gap seal member contacts the primary surfaces thereby spanning a gap between the edge seal member and the substrate, the object, or both.

60. A method according to claim 58, wherein the gap seal member has inner and outer edges at least one of which edges is tapered such that the distance of the surface of the gap seal member facing away from the primary surface of the edge seal member or the substrate, the object, or both, decreases towards the edge of the gap seal member.

61. A method according to claim 58, further comprising holding the gap seal member in place using a vacuum port in the primary surface of the edge seal member.

62. A method according to claim 49, further comprising varying the distance of the primary surface of the substrate, the object, or both, relative to the remainder of the substrate table using an actuator of the substrate table.

63. A method according to claim 49, wherein an object is positioned on the substrate table and the object comprises a sensor system component.

64. A method according to claim 49, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

65. A device manufacturing method comprising:

providing a liquid, using a liquid supply system, in a space between a projection system and a substrate supported on a substrate table, the substrate table comprising an edge seal member at least partly surrounding an edge of the substrate, an object positioned on the substrate table, or both, the edge seal member providing an upward- facing primary surface substantially co-planar with a primary surface of the substrate, the object, or both;

providing a further edge seal member extending across a gap between the edge seal member and the substrate, the object, or both, the further edge seal member contacting with the substrate, the object, or both, wherein the further edge seal member is movable relative to the edge seal member;

projecting a patterned beam, using the projection beam and through the liquid, onto a target portion of the substrate supported by the substrate table; and

blocking liquid from, or in, the gap using the further edge seal member.

66. A method according to claim 65, wherein the further edge seal member is flexible.

67. A method according to claim 66, wherein the flexible further edge seal member is attached to the edge seal member.

68. A method according to claim 66, wherein the flexible further edge seal member has a port, connected to a vacuum source, adjacent its end distal from the edge seal member, and further comprising, on actuation of the vacuum source, deflecting the flexible further edge seal member upwards to contact against the substrate, the object, or both, to form a seal between the flexible further edge seal member and the substrate, the object, or both, due to the force generated by the vacuum source acting on the substrate, the object, or both.

69. A method according to claim 66, further providing a second flexible further edge seal member attached under the substrate, the object, or both, to the substrate table and with a free end radially outwardly from the attachment point.

70. A method according to claim 65, further comprising applying a force, by the further edge seal member, to the substrate, the object, or both, in a direction away from the substrate table when the substrate, the object, or both, is held on the substrate table.

71. A method according to claim 65, wherein an object is positioned on the substrate table and the object comprises a sensor system component.

72. A method according to claim 65, wherein the edge seal member, the further edge seal member, or both, is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

73. A method according to claim 65, further comprising confining the liquid essentially to a localized area on the substrate table smaller than an area of the substrate.

74. A method according to claim 65, wherein the substrate table further comprises a vacuum port to provide vacuum to a gap between the edge seal member and the substrate, the object, or both, the vacuum port being positioned on a side of the gap opposite a projection system for projecting the patterned beam.