Rule and lithographic process co-optimization
First Claim
Patent Images
1. A method comprising:
- optimizing, by a hardware computer system, a design variable of a pattern transfer process, involving a lithographic apparatus, for manufacturing devices and optimizing a design variable of a design rule for the pattern transfer process based on the optimizing of the design variable of the pattern transfer process, to determine a value of the design variable of the design rule; and
using the design rule with the determined value to configure the pattern transfer process.
1 Assignment
0 Petitions
Accused Products
Abstract
A computer-implemented method for obtaining values of one or more design variables of one or more design rules for a pattern transfer process comprising a lithographic projection apparatus, the method comprising: simultaneously optimizing one or more design variables of the pattern transfer process and the one or more design variables of the one or more design rules. The optimizing comprises evaluating a cost function that measures a metric characteristic of the pattern transfer process, the cost function being a function of one or more design variables of the pattern transfer process and one or more design variables of the one or more design rules.
47 Citations
21 Claims
-
1. A method comprising:
-
optimizing, by a hardware computer system, a design variable of a pattern transfer process, involving a lithographic apparatus, for manufacturing devices and optimizing a design variable of a design rule for the pattern transfer process based on the optimizing of the design variable of the pattern transfer process, to determine a value of the design variable of the design rule; and using the design rule with the determined value to configure the pattern transfer process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
-
-
19. A method comprising:
-
evaluating, by a hardware computer system, a cost function that assesses a metric characteristic of a pattern transfer process, involving a lithographic apparatus and physical patterning device, for manufacturing devices, the cost function being a function of a design variable of the pattern transfer process and a design variable of a design rule for the pattern transfer process; changing a value of the design variable of the pattern transfer process and/or the design variable of the design rule and re-evaluating, by the hardware computer system, the cost function based on the changed value, until a termination condition is satisfied; and using the design rule with the value of the design variable of the design rule at the termination condition, to configure the pattern transfer process.
-
-
20. A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions, when executed by a computer, configured to cause the computer to:
-
optimize a design variable of a pattern transfer process, involving a lithographic apparatus, for manufacturing devices and optimize a design variable of a design rule for the pattern transfer process based on the optimizing of the design variable of the pattern transfer process, to determine a value of the design variable of the design rule; and use the design rule with the determined value to configure the pattern transfer process.
-
-
21. A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions, when executed by a computer, configured to cause the computer to:
-
evaluate a cost function that assesses a metric characteristic of a pattern transfer process, involving a lithographic apparatus and physical patterning device, for manufacturing devices, the cost function being a function of a design variable of the pattern transfer process and a design variable of a design rule for the pattern transfer process; change a value of the design variable of the pattern transfer process and/or the design variable of the design rule and re-evaluate, by the hardware computer system, the cost function based on the changed value, until a termination condition is satisfied; and use the design rule with the value of the design variable of the design rule at the termination condition, to configure the pattern transfer process.
-
Specification