Plasma apparatus and method of fabricating semiconductor device using the same
First Claim
1. A plasma apparatus comprising:
- a process chamber having an inner space;
a chuck disposed in the process chamber, the chuck having a top surface configured to load a substrate;
a gas supply unit supplying a process gas into the process chamber;
a plasma generating unit generating plasma over the chuck; and
a direct current (DC) power generator configured to apply a DC pulse signal having repetitive periods to the chuck, each period of the DC pulse signal comprising a negative pulse duration during which a negative pulse is applied;
a positive pulse duration during which a positive pulse is applied;
a stable duration after the negative pulse duration and before the positive pulse duration; and
a pulse-off duration, after the positive pulse duration and prior to subsequent application of a negative pulse, during which the negative pulse and the positive pulse are turned off, wherein the direct current (DC) power generator is configured to apply the DC pulse signal in a manner such that the pulse-off duration is longer than the stable duration to allow etch by-products, formed during plasma generation, to escape from an etch region of the substrate.
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Abstract
A plasma apparatus includes a process chamber having an inner space, a chuck disposed in the process chamber and having a top surface on which a substrate is loaded, a gas supply unit supplying a process gas into the process chamber, a plasma generating unit generating plasma over the chuck, and a direct current (DC) power generator applying a DC pulse signal to the chuck. A period of the DC pulse signal may include a negative pulse duration during which a negative pulse is applied, a positive pulse duration during which a positive pulse is applied, and a pulse-off duration during which the negative pulse and the positive pulse are turned off. The positive pulse duration is between the negative pulse duration and the pulse-off duration. The pulse-off duration may comprise a voltage having a lower magnitude than the voltage of the positive pulse, such as a ground voltage.
66 Citations
22 Claims
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1. A plasma apparatus comprising:
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a process chamber having an inner space; a chuck disposed in the process chamber, the chuck having a top surface configured to load a substrate; a gas supply unit supplying a process gas into the process chamber; a plasma generating unit generating plasma over the chuck; and a direct current (DC) power generator configured to apply a DC pulse signal having repetitive periods to the chuck, each period of the DC pulse signal comprising a negative pulse duration during which a negative pulse is applied;
a positive pulse duration during which a positive pulse is applied;
a stable duration after the negative pulse duration and before the positive pulse duration; and
a pulse-off duration, after the positive pulse duration and prior to subsequent application of a negative pulse, during which the negative pulse and the positive pulse are turned off, wherein the direct current (DC) power generator is configured to apply the DC pulse signal in a manner such that the pulse-off duration is longer than the stable duration to allow etch by-products, formed during plasma generation, to escape from an etch region of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A plasma apparatus comprising:
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a process chamber having an inner space; a chuck disposed in the process chamber, the chuck having a top surface configured to load a substrate; an outer ring disposed at an edge of the chuck, the outer ring configured to surround a loaded substrate; a gas supply unit supplying a process gas into the process chamber; a plasma generating unit generating plasma over the chuck; and a direct current (DC) power generating unit applying a first DC pulse signal to the chuck and a second DC pulse signal to the outer ring, wherein the first and second DC pulse signals comprise repetitive periods, each period of each of the first and second DC pulse signals comprising;
a negative pulse duration followed by a positive pulse duration followed by a pulse-off duration,wherein the direct current (DC) power generating unit is configured to control the pulse-off duration of each of the first and second DC pulse signals in a manner such that etch by-products, formed during plasma generation, can escape from an etch region of the substrate and be deposited on an upper surface of the substrate, wherein the first DC pulse signal and the second DC pulse signal comprise a first negative pulse and a second negative pulse, respectively, during the negative pulse duration, wherein the first DC pulse signal and the second DC pulse signal comprise a first positive pulse and a second positive pulse, respectively, during the positive pulse duration, respectively, and wherein the first DC pulse signal and the second DC pulse signal each comprise a ground voltage during off during the pulse-off duration, and wherein the second DC pulse signal comprises lower potential magnitudes than the first DC pulse signal.
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13. A plasma apparatus comprising:
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a process chamber configured to maintain a plasma; a chuck within the process chamber, the chuck comprising a surface configured to mount a wafer; one or more electrodes configured to generate plasma within the chamber; and a DC voltage generator configured to repetitively generate a first DC signal and apply the first DC signal to the chuck, the first DC signal consisting of a first portion and a second portion, wherein the first portion consists of a DC signal that is not greater than −
500V,wherein the second portion consists of a DC signal that is equal to or greater than about a ground potential, wherein a duration of the second portion is greater than a duration of the first portion, and wherein the DC voltage generator is configured to control the duration of the second portion in a manner such that etch by-products, formed during plasma generation, can escape from an etch region of the wafer and be deposited on an upper surface of the wafer. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22)
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Specification