Lithographic apparatus and device manufacturing method

• US 9,494,869 B2
• Filed: 12/05/2012
• Issued: 11/15/2016
• Est. Priority Date: 12/27/2011
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Butler, Hans, Bleeker, Arno Jan, Hennus, Pieter Renaat Maria, Hoeks, Martinus Hendricus Henricus, Hol, Sven Antoin Johan, Van Der Schoot, Harmen Klaas, Slaghekke, Bernardus Antonius, Tinnemans, Patricius Aloysius Jacobus, Van Der Wijst, Marc Wilhelmus Maria, Zaal, Koen Jacobus Johannes Maria, Cadee, Theodorus Petrus Maria, Beerens, Ruud Antonius Catharina Maria, Fischer, Olof Martinus Josephus, Aangenent, Wilhelmus Henricus Theodorus Maria, Bosch, Niels Johannes Maria
• Primary Examiner(s): Kreutzer, Colin
• Application Number:
  US14/357,530
• Publication Number:
  US 20140340666A1
• Time in Patent Office: 1,441 Days
• Field of Search: 310/51, 355/46, 355/67, 355/77
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70366 Rotary scanning
• CPC Class Codes: G03F 7/70391 Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
• CPC Class Codes: G03F 7/704 Scanned exposure beam, e.g. raster-, rotary- and vector scanning mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Claims

1. An exposure apparatus, comprising:

a projection system configured to project a plurality of radiation beams onto a target;

a movable frame that is at least rotatable around an axis;

an actuator system to cause the movable frame to rotate; and

a controller to adjust a position of the movable frame and a modulation or intensity characteristic of at least one of the radiation beams, to compensate at least in part for imbalance of or applied to the movable frame or imbalance of or applied to another movable frame.

2. The apparatus of claim 1, comprising a plurality of movable frames that are each at least rotatable around an axis and supported by a common frame, wherein the other movable frame is one of the plurality of movable frames.

3. The apparatus of claim 2, wherein the controller is configured to adjust the position of the movable frame such that a force that the movable frame puts on the common frame in combination with forces put on the common frame by the other movable frames leads to an effective cancellation of the forces.

4. The apparatus of claim 1, wherein the adjustment of the position of the movable frame comprises a change in phase angle of the movable frame.

5. The apparatus of claim 4, wherein the change in phase angle comprises a change in phase angle from the angular position of a lens of a plurality of lenses of the movable frame to the angular position of another lens of the plurality of lenses of the movable frame.

6. The apparatus of claim 1, further comprising a measurement system configured to measure the imbalance of at least one movable frame.

7. The apparatus of claim 6, wherein the measurement system is configured to obtain a first measurement signal of the at least one movable frame, when disturbed, at a frequency different than its rotating frequency and compare the first measurement signal with a second measurement signal of the at least one movable frame at its rotating frequency to obtain the position of the imbalance.

8. The apparatus of claim 7, wherein the measurement system is configured to determine the amplitude of the imbalance using the position of the imbalance and the same frequency for both the first and second measurement signals.

9. The apparatus of claim 7, wherein the measurement system is configured to obtain the first measurement signal at a plurality of different frequencies.

10. The apparatus of claim 6, wherein the measurement system is configured to determine the imbalance by measuring the position, vibration of and/or force applied to a frame supporting the at least one movable frame.

11. The apparatus of claim 6, wherein the measurement system is configured to determine the imbalance by measuring radiation projected through a lens of the at least one frame using a radiation sensor.

12. A device manufacturing method comprising:

projecting a plurality of radiation beams onto a target;

rotating a movable frame around an axis using an actuator system; and

adjusting a position of the frame to compensate at least in part for imbalance of or applied to the frame or imbalance of or applied to another movable frame, the adjusting the position of the movable frame comprising changing a phase angle of the movable frame.

13. The method of claim 12, wherein there are a plurality of movable frames that are each at least rotatable around an axis and supported by a common frame, wherein the other movable frame is one of the plurality of movable frames.

20. The method of claim 12, further comprising measuring the imbalance of at least one movable frame using a measurement system and the adjusting the position of the movable frame is based on the measurement of the imbalance.

14. An exposure apparatus, comprising:

a projection system configured to project a plurality of radiation beams onto a target;

a plurality of movable frames that are each at least rotatable around a respective axis and supported by a common frame;

an actuator system to cause at least one of the movable frames to rotate; and

a controller to adjust a position of the at least one movable frame to compensate at least in part for imbalance of or applied to the at least one movable frame or imbalance of or applied to another frame of the movable frames, such that a force that the at least one movable frame puts on the common frame in combination with force put on the common frame by the other movable frame leads to an effective cancellation of the forces.

15. The apparatus of claim 14, wherein the adjustment of the position of the at least one movable frame comprises a change in phase angle of the at least one movable frame.

16. The apparatus of claim 14, further comprising a measurement system configured to measure the imbalance of at least one movable frame.

17. An exposure apparatus, comprising:

a projection system configured to project a plurality of radiation beams onto a target;

a movable frame that is at least rotatable around an axis;

an actuator system to cause the movable frame to rotate; and

a controller to adjust a position of the movable frame to compensate at least in part for imbalance of or applied to the movable frame or imbalance of or applied to another movable frame, the adjustment of the position of the movable frame comprising a change in phase angle of the movable frame.

18. The apparatus of claim 17, wherein the change in phase angle comprises a change in phase angle from the angular position of a lens of a plurality of lenses of the movable frame to the angular position of another lens of the plurality of lenses of the movable frame.

19. The apparatus of claim 17, further comprising a measurement system configured to measure the imbalance of at least one movable frame.