Multi-luminous element and method for manufacturing same
First Claim
1. A multi-luminous element comprising:
- a buffer layer located on a substrate;
a first type semiconductor layer located on the buffer layer;
a first active layer located on the first type semiconductor layer, the first active layer (i) having one or more openings to expose the first type semiconductor layer and (ii) emitting light of a first wavelength;
a second active layer disposed at said one or more openings of the first active layer, and emitting light of a second wavelength;
a second type semiconductor layer located on the first active layer and the second active layer, anda mask pattern located between the first active layer and the second type semiconductor layer,wherein the first active layer and the second active layer are horizontally and repeatedly disposed side by side.
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Abstract
The present invention relates to a multi-luminous element and a method for manufacturing the same. The present invention provides the multi-luminous element comprising: a buffer layer disposed on a substrate; a first type semiconductor layer disposed on the buffer layer; a first active layer which is disposed on the first type semiconductor layer and is patterned to expose a part of the first type semiconductor layer; a second active layer disposed on the first type semiconductor layer which is exposed by the first active layer; and a second type semiconductor layer disposed on the first active layer and the second active layer, the first and second active layers being repeatedly disposed in the horizontal direction, and the method for manufacturing the same. The multi-luminous element according to the present invention reduces loss of light emitting efficiency and can generate multi-wavelength light by repeatedly disposing the first and second active layers in the horizontal direction.
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12 Claims
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1. A multi-luminous element comprising:
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a buffer layer located on a substrate; a first type semiconductor layer located on the buffer layer; a first active layer located on the first type semiconductor layer, the first active layer (i) having one or more openings to expose the first type semiconductor layer and (ii) emitting light of a first wavelength; a second active layer disposed at said one or more openings of the first active layer, and emitting light of a second wavelength; a second type semiconductor layer located on the first active layer and the second active layer, and a mask pattern located between the first active layer and the second type semiconductor layer, wherein the first active layer and the second active layer are horizontally and repeatedly disposed side by side. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification