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Two stage progressive resistance trainer

  • US 9,511,271 B2
  • Filed: 09/16/2015
  • Issued: 12/06/2016
  • Est. Priority Date: 09/18/2014
  • Status: Active Grant
First Claim
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1. A two-stage trainer for use with a driving mechanism having a driving wheel, said driving wheel rotatable with respect to said driving mechanism about a first rotational axis, said trainer comprising:

  • a frame having a mounting portion adapted to releasably affix said first rotational axis of said driving mechanism with respect to said frame;

    a pivot arm being pivotably affixed to said frame about a pivot axis;

    a resistance device having a cylinder rotatably affixed about a central axis and resisting rotation with respect to said central axis, said resistance device having an outer wall defining an inner chamber, said resistance device affixed to said pivot arm, said central axis being substantially parallel to said pivot axis;

    a first magnet partially located in said inner chamber and rotatable with respect to said central axis, said first magnet movable between a first position corresponding to when said cylinder is at rest and a second position when said cylinder rotates;

    a second magnet moveable between a first and second position, said first position defined by said second magnet being located at a relatively far distance from said cylinder and said second position defined by said second magnet being relatively close to said cylinder, said second magnet being linked to said first magnet so that movement of said first magnet from its said first position toward its said second position causes movement of said second magnet from its said first position toward its said second position;

    a biased contact point located where said resistance device contacts said driving wheel when said driving mechanism is affixed to said mounting portion of said frame, said resistance device being urged toward said driving wheel by a biasing force; and

    said biasing force increasing from a relatively low force when said resistance device has a relatively low resistance to rotation and a relatively high force when said resistance device has a relatively high resistance to rotation.

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