Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method

• US 9,513,561 B2
• Filed: 03/16/2012
• Issued: 12/06/2016
• Est. Priority Date: 04/21/2011
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan, Hoeks, Martinus Hendricus Henricus, Cadee, Theodorus Petrus Maria
• Primary Examiner(s): Asfaw, Mesfin T
• Application Number:
  US14/006,934
• Publication Number:
  US 20140009746A1
• Time in Patent Office: 1,726 Days
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70133 Measurement of illumination distribution, in pupil plane or field plane
• CPC Class Codes: G03F 7/70391 Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus

Abstract

A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.

Claims

1. A lithographic apparatus, configured to project a patterned beam of radiation onto a substrate comprising:

a plurality of radiation source units, each comprising a radiation source configured to provide a portion of the patterned beam of radiation and configured such that at least one radiation source unit of the plurality of radiation source units installed in the lithographic apparatus is separately removable from another radiation source unit of the plurality of radiation source units installed in the lithographic apparatus;

a control system, configured to monitor a parameter of the performance of the radiation source units; and

a mechanical replacement mechanism having an actuating structure, configured to be operated in response to an instruction from the control system to replace the at least one radiation source unit with a replacement unit;

wherein the control system is configured to control the replacement mechanism to replace at least one radiation source unit if a criterion is met based on the monitored parameter of performance of one of the radiation source units.

2. The lithographic apparatus according to claim 1, wherein the control system is configured to control the replacement mechanism to replace a plurality of radiation source units including the radiation source unit for which the criterion is met based on the monitored parameter of performance.

3. The lithographic apparatus according to claim 1, wherein a threshold value is set for a monitored parameter of performance;

and responsive to the monitored parameter of performance of a radiation source unit passing the threshold value, the control system determines that the radiation source unit should be replaced.

4. The lithographic apparatus according to claim 3, wherein a threshold value for the parameter of performance is set for each radiation source unit.

5. The lithographic apparatus according to claim 4, wherein the threshold value for the parameter of performance for each radiation source unit is set as a certain proportion of an initial value of the parameter of performance determined when the radiation source unit is first installed.

6. The lithographic apparatus according to claim 1, configured such that, in operation, there is a first time period when radiation is projected onto a substrate and a second time period when radiation is not projected onto a substrate;

and

the control system is configured such that, responsive to the control system determining based on monitoring during the first time period that at least one of the radiation source units should be replaced, it controls the replacement mechanism to replace the at least one radiation source unit in a subsequent second time period.

7. The lithographic apparatus according to claim 1, wherein the parameter monitored by the control system comprises a ratio of electrical current supplied to the radiation source of each radiation source unit to intensity of the radiation output by the radiation source.

8. The lithographic apparatus according to claim 7, wherein each of the radiation source units comprises:

a sensor to measure the electrical current provided to the radiation source and to measure the intensity of radiation output by the radiation source; and

a control unit, configured to determine from the measurement of the sensor if the criterion has been met for the replacement of the radiation source unit,

wherein the control system of the lithographic apparatus comprises each of the control units of the radiation source units and a central controller,

the control units of the radiation source units are configured to send a control signal to the central controller responsive to the respective control unit determining that the criterion has been met for the replacement of the radiation source unit, and

the central controller is configured to control the replacement mechanism to replace a radiation source unit based on the control signal from the control unit of the radiation source unit.

9. The lithographic apparatus according to claim 1, wherein each of the radiation source units is an individually controllable radiation source unit.

10. The lithographic apparatus according to claim 1, wherein the replacement mechanism is configured such that it can replace any of the radiation source units.

11. The lithographic apparatus according to claim 1, comprising a plurality of replacement mechanisms, each configured to be operated under control of the control system to replace one of a respective plurality of the radiation source units with a replacement unit,

wherein the lithographic apparatus is configured such that each of the radiation source units can be replaced by at least one of the replacement mechanisms.

12. The lithographic apparatus according to claim 1, further comprising a magazine, configured to store a plurality of replacement radiation source units,

wherein the replacement mechanism is configured to remove a radiation source unit from the magazine and use it to replace a radiation source unit that has been in use in the lithographic apparatus.

13. The lithographic apparatus according to claim 1, further comprising a disposal unit, configured to receive a radiation source unit that has been replaced,

wherein the replacement mechanism is configured to place a radiation source unit that has been replaced in the disposal unit.

14. The lithographic apparatus according to claim 1, wherein each of the radiation source units comprises an external reference surface;

the lithographic apparatus comprises a plurality of receiving locations configured to receive a respective one of the radiation source units; and

each of the receiving locations comprises an reference surface, complementary to the reference surface of the radiation source unit, and configured such that, when a radiation source unit is fixed in a receiving location, the reference surfaces meet such that the position and/or orientation of the radiation source unit relative to the receiving location corresponds to a certain desired position and/or orientation.

15. The lithographic apparatus according to claim 14, wherein each of the radiation source units is formed such that the position and/or orientation of a radiation source within the unit is predetermined relative to the external reference surface of the radiation source unit to within an accuracy range such that any position error is less than 1 μ

m and/or any radiation beam pointing error is less than 1 mrad.

16. The lithographic apparatus according to claim 14, wherein the replacement mechanism is configured to locate a replacement radiation source unit in a receiving location such that the reference surfaces of the receiving location and the radiation source unit meet.

17. A lithographic apparatus, configured to project a patterned beam of radiation onto a substrate comprising:

a plurality of radiation source units, each comprising a radiation source configured to provide a portion of the patterned beam of radiation;

a control system, configured to monitor a parameter of the performance of the radiation source units; and

a replacement mechanism, configured to be operated in response to an instruction from the control system to replace at least one of the radiation source units with a replacement unit;

wherein the control system is configured to control the replacement mechanism to replace at least one radiation source unit if a criterion is met based on the monitored parameter of performance of one of the radiation source units, and

wherein the replacement mechanism comprises a sensor to determine the position and/or orientation of a beam of radiation output from a radiation source unit;

and configured such that, when placing a replacement radiation source unit in a receiving location, the replacement mechanism uses information from the sensor to position the radiation source unit such that the position and/or orientation of the beam of radiation relative to the receiving location corresponds to a predetermined position and/or orientation to within an accuracy range.

18. A method for maintaining a lithographic apparatus that comprises a plurality of radiation source units, each comprising a radiation source configured to provide a portion of a patterned beam of radiation to be projected onto a substrate and configured such that at least one radiation source unit of the plurality of radiation source units installed in the lithographic apparatus is separately removable from another radiation source unit of the plurality of radiation source units installed in the lithographic apparatus, the method comprising:

monitoring a parameter of the performance of the radiation source units; and

replacing the at least one radiation source unit with a replacement unit based on the results of the monitoring using an actuating structure of a replacement mechanism within the lithographic apparatus,

wherein the replacement mechanism is operated to replace a radiation source unit if a criterion is met based on the monitored parameter of performance of one of the radiation source units.

19. A device manufacturing method, comprising:

using a lithographic apparatus to project a patterned beam of radiation onto successive substrates; and

using the method of claim 18 to maintain the lithographic apparatus during the use of the lithographic apparatus.

20. The method of claim 18, further comprising determining the position and/or orientation of a beam of radiation output from a radiation source unit using a sensor, and using, when placing a replacement radiation source unit in a receiving location, the information from the sensor to position the radiation source unit such that the position and/or orientation of the beam of radiation relative to the receiving location corresponds to a predetermined position and/or orientation to within an accuracy range.