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Touch screen and manufacturing method thereof

  • US 9,524,043 B2
  • Filed: 10/20/2014
  • Issued: 12/20/2016
  • Est. Priority Date: 02/06/2009
  • Status: Active Grant
First Claim
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1. A method of manufacturing a touch screen, comprising the steps of:

  • a) forming a conductive layer on a substrate;

    b) forming an etching resist pattern on the conductive layer; and

    c) forming a first conductive pattern having a line width smaller than the line width of the etching resist pattern by over-etching the conductive layer by using the etching resist pattern as a mask,wherein in the step b), a line edge roughness (LER) of the etching resist pattern is controlled to be 0.1 to 5 micrometers,wherein in step c), an etching time of the conductive layer ranges from a just-etching time to a time 2,000% more than the just-etching time, and the just-etching time means a time required when a pattern is etched in the same shape as the shape of the mask,wherein the first conductive pattern has a line width of 100 micrometer or less, andwherein the first conductive pattern has a pattern shape formed continuously on an area of 7 inch or more.

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