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Metrology method and apparatus, and device manufacturing method

  • US 9,535,342 B2
  • Filed: 03/25/2014
  • Issued: 01/03/2017
  • Est. Priority Date: 11/12/2010
  • Status: Active Grant
First Claim
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1. A method comprising:

  • forming a structure on the substrate;

    detecting, via at least two optical paths, an image of the structure through an optical system while the structure is illuminated with a beam of radiation;

    determining at least one parameter of the structure based on intensity values derived from the detected image, wherein the image of the structure is smaller than an image field of the optical system;

    detecting a position of the image within the image field; and

    applying a correction to the detected image to reduce an influence on the at least one parameter caused by a difference between the at least two optical paths.

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