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Semiconductor socket with direct selective metalization

  • US 9,536,815 B2
  • Filed: 03/14/2013
  • Issued: 01/03/2017
  • Est. Priority Date: 05/28/2009
  • Status: Active Grant
First Claim
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1. A semiconductor socket comprising:

  • a plurality of through holes extending through a substrate from a first surface of the substrate to a second surface of the substrate, each of the plurality of through holes defined by an inner wall of the substrate extending between the first surface and the second surface;

    a conductive material deposited around the inner walls of the plurality of holes to create a plurality of conductive structures;

    at least one dielectric layer deposited on the inner walls and being bonded to the conductive structures; and

    a plurality of discrete contact members disposed in the plurality of the through holes, the plurality of contact members each comprising a proximal end accessible from the second surface, and a distal end extending above the first surface, wherein the conductive structures extend around at least portion of each of the plurality of discrete contact members and the dielectric layer insulating the contact members from the conductive structures.

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