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Substrate with silicon carbide film, semiconductor device, and method for producing substrate with silicon carbide film

  • US 9,536,954 B2
  • Filed: 10/29/2015
  • Issued: 01/03/2017
  • Est. Priority Date: 10/31/2014
  • Status: Active Grant
First Claim
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1. A substrate with a silicon carbide film, comprising:

  • a silicon substrate;

    a first mask formed on part of the silicon substrate;

    a first silicon carbide film formed on the silicon substrate and on the first mask;

    a second mask formed on at least part of the first silicon carbide film; and

    a second silicon carbide film formed on the first silicon carbide film and on the second mask, whereinthe first mask has multiple first openings where the silicon substrate is exposed,the first silicon carbide film is formed so as to cover the first openings and the first mask, and also has a concave portion with an inclined side surface on an upper portion of the first mask, andthe second mask is formed on the concave portion.

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