Formed article, method for producing same, electronic device member, and electronic device
First Claim
1. A method for producing a formed article comprising an ion-implanted layer, the method comprising:
- implanting ions into a surface area of a layer comprising a polysilazane compound and a clay mineral to form said ion-implanted layer;
wherein a total content of the polysilazane compound and the clay mineral in the layer comprising the polysilazane compound and the clay mineral is 70 wt % or more.
1 Assignment
0 Petitions
Accused Products
Abstract
Provided a formed article comprising a layer that includes a polysilazane compound and a clay mineral, and having a water vapor transmission rate at a temperature of 40° C. and a relative humidity of 90% of 6.0 g/m2/day or less. Also provided are a method for producing the formed article, an electronic device member including the formed article, and an electronic device including the electronic device member. The formed article exhibiting an excellent gas barrier capability, excellent transparency, and excellent bending resistance, a method for producing the formed article, and an electronic device member, or the like, comprising the formed article are provided.
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Citations
15 Claims
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1. A method for producing a formed article comprising an ion-implanted layer, the method comprising:
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implanting ions into a surface area of a layer comprising a polysilazane compound and a clay mineral to form said ion-implanted layer; wherein a total content of the polysilazane compound and the clay mineral in the layer comprising the polysilazane compound and the clay mineral is 70 wt % or more. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method for producing a formed article comprising an ion-implanted layer, the method comprising:
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implanting ions into a surface area of a layer comprising a polysilazane compound and a clay mineral to form said ion-implanted layer; wherein the ions are implanted by a plasma ion implantation method; wherein the plasma ion implantation method includes applying a negative high voltage pulse to a formed body that includes the layer comprising the polysilazane compound and the clay mineral, wherein the surface area of the layer comprising the polysilazane compound and the clay mineral is exposed to plasma containing ions; and wherein a pulse width when applying the negative high voltage pulse is 1 to 15 μ
s, and a voltage applied when generating plasma is −
1 to −
50 kV.
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Specification