Controller for optical device, exposure method and apparatus, and method for manufacturing device

• US 9,551,942 B2
• Filed: 01/08/2016
• Issued: 01/24/2017
• Est. Priority Date: 11/06/2007
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Owa, Soichi
• Primary Examiner(s): SULLIVAN, CALEEN O
• Application Number:
  US14/991,667
• Publication Number:
  US 20160124314A1
• Time in Patent Office: 382 Days
• Field of Search: 355/77, 355/71, 430/311
• US Class Current: 1/1
• CPC Class Codes: G03F 7/20 Exposure; Apparatus therefor photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: G03F 7/70091 Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70116 Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/702 Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.

Claims

1. An exposure apparatus which exposes an object with exposure light from a light source, the exposure apparatus comprising:

a first mirror array including a plurality of mirrors and arranged on an optical path of the exposure light from the light source;

a first optical system arranged on an optical path of exposure light via the first mirror array and configured to irradiate an illumination pupil with the exposure light via the first mirror array, the exposure light having a certain light intensity distribution at the illumination pupil;

a second optical system arranged on an optical path of exposure light via the first optical system and configured to illuminate an irradiated plane with the exposure light via the first optical system;

a second mirror array including a plurality of mirrors and arranged on the irradiated plane;

a projection optical system including an aperture stop and configured to project a predetermined pattern on the object with exposure light from the second mirror array; and

a controller which controls states of the plurality of mirrors of the first and second mirror arrays, wherein the controller changes the states of the plurality of mirrors of the first mirror array in accordance with the states of the plurality of mirrors of the second mirror array.

2. The exposure apparatus according to claim 1, wherein the controller changes the states of the plurality of mirrors of the second mirror array in accordance with the pattern that is to be formed on the object.

3. The exposure apparatus according to claim 1, wherein:

the exposure light is a pulsed light, and

the states of the plurality of mirrors of the second mirror array are changed whenever a predetermined number of pulsed lights is emitted.

4. The exposure apparatus according to claim 1, wherein the first optical system includes:

a relay optical system having a front focal point located in a plane on which the plurality of mirrors of the first mirror array are aligned, and

a fly'"'"'s eye optical system including a plurality of optical surfaces which are two-dimensionally aligned and are arranged on an optical path of light via the relay optical system.

5. The exposure apparatus according to claim 4, wherein a rear focal point of the relay optical system is located in a plane on which the plurality of optical surfaces of the fly'"'"'s eye optical system are aligned.

6. The exposure apparatus according to claim 1, wherein the illumination pupil is optically conjugated with the aperture stop of the projection optical system.

7. An exposure apparatus which exposes an object with exposure light from a light source, the exposure apparatus comprising:

a first mirror array including a plurality of mirrors and arranged on an optical path of the exposure light from the light source;

a first optical system arranged on an optical path of exposure light via the first mirror array and configured to irradiate an illumination pupil with the exposure light via the first mirror array, the exposure light having a certain light intensity distribution at the illumination pupil;

a second optical system arranged on an optical path of exposure light via the first optical system and configured to illuminate an irradiated plane with the exposure light via the first optical system;

a second mirror array including a plurality of mirrors and arranged on the irradiated plane;

a projection optical system including an aperture stop and configured to project a predetermined pattern on the object with exposure light from the second mirror array; and

a controller which controls states of the plurality of mirrors of the first and second mirror arrays, wherein the controller changes the states of the plurality of mirrors of the first mirror array in accordance with the pattern that is to be formed on the object.

8. The exposure apparatus according to claim 7, wherein the controller changes the states of the plurality of mirrors of the second mirror array in accordance with the pattern that is to be formed on the object.

9. The exposure apparatus according to claim 7, wherein:

the exposure light is a pulsed light, and

the states of the plurality of mirrors of the second mirror array are changed whenever a predetermined number of pulsed lights is emitted.

10. The exposure apparatus according to claim 7, wherein the first optical system includes:

a relay optical system having a front focal point located in a plane on which the plurality of mirrors of the first mirror array are aligned, and

a fly'"'"'s eye optical system including a plurality of optical surfaces which are two-dimensionally aligned and are arranged on an optical path of light via the relay optical system.

11. The exposure apparatus according to claim 10, wherein a rear focal point of the relay optical system is located in a plane on which the plurality of optical surfaces of the fly'"'"'s eye optical system are aligned.

12. The exposure apparatus according to claim 7, wherein the illumination pupil is optically conjugated with the aperture stop of the projection optical system.