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Vapor deposition systems and methods

  • US 9,556,519 B2
  • Filed: 11/27/2011
  • Issued: 01/31/2017
  • Est. Priority Date: 06/28/2004
  • Status: Active Grant
First Claim
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1. An atomic layer deposition system comprising:

  • a cabinet having a cabinet top with multiple holes there through;

    at least one precursor supply located in the cabinet under the cabinet top;

    a reaction chamber located on the cabinet top and designed to enclose a substrate, the reaction chamber including a reactor base and a reactor lid;

    wherein;

    the reactor base is a single continuous structure that comprises;

    an annular sidewall that defines a lateral extent of an enclosed reactor space of the reaction chamber;

    an outer annular horizontal bottom surface including at least two openings therein; and

    an inner substrate area for mounting a substrate thereon, the inner substrate area comprising a recessed horizontal bottom surface that is vertically recessed downward with respect the outer annular horizontal bottom surface;

    the reactor lid is another single continuous structure whose bottom surface defines a top surface of the reactor space; and

    the reactor base and the reactor lid are mechanically connected to provide an enclosed reactor space upon closing of the reactor lid and to provide access into the reaction chamber for loading the substrate after opening of the reactor lid; and

    at least one precursor port having a respective outlet located in a respective opening among the at least two openings in the outer annular horizontal bottom surface of the reactor base, extending through a respective hole among the multiple holes in the cabinet top, and connected to the least one precursor supply.

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