Deposition rate measuring apparatus

• US 9,562,798 B2
• Filed: 06/30/2015
• Issued: 02/07/2017
• Est. Priority Date: 01/22/2015
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: Choi, Hee Dok
• Primary Examiner(s): Thompson, Jewel V
• Application Number:
  US14/754,781
• Publication Number:
  US 20160216143A1
• Time in Patent Office: 588 Days
• Field of Search: 738/658, 738/65, 738/665, 118/688, 118/715, 427/9, 356/72
• US Class Current: 1/1
• CPC Class Codes: C23C 14/546 using crystal oscillators
• CPC Class Codes: G01F 1/662 Constructional details
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring

Abstract

A deposition rate measuring apparatus, including a crystal sensor facing a specific deposition source among a plurality of deposition sources in a deposition apparatus; a deposition-preventing bracket in a front portion of the crystal sensor, the deposition-preventing bracket having an opening that assists inflow of a specific deposition material, the deposition-preventing bracket extending from the opening, and the deposition-preventing bracket surrounding the crystal sensor to prevent interference due to at least one deposition material from at least one adjacent deposition source adjacent to the specific deposition source; and one or more cover portions spaced apart from the opening inward of the deposition-preventing bracket by a predetermined length.

Claims

1. A deposition rate measuring apparatus, comprising:

a crystal sensor facing a specific deposition source among a plurality of deposition sources in a deposition apparatus;

a deposition-preventing bracket in a front portion of the crystal sensor, the deposition-preventing bracket having an opening that assists inflow of a specific deposition material, the deposition-preventing bracket extending from the opening, and the deposition-preventing bracket surrounding the crystal sensor to prevent interference due to at least one deposition material from at least one adjacent deposition source adjacent to the specific deposition source; and

one or more cover portions spaced apart from the opening inward of the deposition-preventing bracket by a predetermined length.

2. The deposition rate measuring apparatus as claimed in claim 1, wherein the deposition-preventing bracket or each cover portion is formed to have a shape such that an incident angle of the at least one deposition material is equal to or less than a predetermined angle at one or more positions.

3. The deposition rate measuring apparatus as claimed in claim 2, wherein the deposition-preventing bracket has a cylindrical shape, a cone shape which becomes wide toward the opening, or a cone shape which becomes narrow toward the opening.

4. The deposition rate measuring apparatus as claimed in claim 2, wherein:

one of the one or more cover portions is at an inner position of the deposition-preventing bracket adjacent to the crystal sensor, and

another cover portion is at another inner position of the deposition-preventing bracket far away from the crystal sensor.

5. The deposition rate measuring apparatus as claimed in claim 4, wherein each cover portion has a circular plate shape including a feature hole at a central portion.

6. The deposition rate measuring apparatus as claimed in claim 5, wherein a diameter of a first feature hole of a first cover portion adjacent to the crystal sensor from among the one or more cover portions is larger than a diameter of a second feature hole of a second cover portion away from the crystal sensor.

7. The deposition rate measuring apparatus as claimed in claim 3, wherein:

the deposition-preventing bracket has the cone shape which becomes narrow toward the opening, and

each cover portion is tapered in a direction of the crystal sensor with respect to an inner wall of the deposition-preventing bracket.

8. The deposition rate measuring apparatus as claimed in claim 4, wherein:

the deposition-preventing bracket has a cone shape which becomes narrow toward the opening, and

each cover portion has a funnel shape which becomes wide toward the opening as opposed to the deposition-preventing bracket.

9. The deposition rate measuring apparatus as claimed in claim 5, wherein a relative position of each cover portion is adjustable in a length direction with respect to an inner wall of the deposition-preventing bracket.

10. The deposition rate measuring apparatus as claimed in claim 1, wherein:

the specific deposition material is a dopant material, and the at least one deposition material is a host material, and

the dopant material is monitored without interference due to the host material.

11. The deposition rate measuring apparatus as claimed in claim 9, wherein:

the deposition-preventing bracket has a pair of guide groove portions along the inner wall in the length direction, and

each cover portion has a pair of engaging protrusions corresponding to the pair of guide groove portions in an external circumference portion having the circular plate shape including the feature hole at the central portion.