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Lithographic apparatus, substrate and device manufacturing method

  • US 9,563,131 B2
  • Filed: 11/06/2015
  • Issued: 02/07/2017
  • Est. Priority Date: 04/16/2012
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • an illumination system configured to condition a radiation beam;

    a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

    a substrate table configured to hold the substrate; and

    a projection system configured to project the patterned radiation beam onto a target portion of the substrate,wherein the lithographic apparatus is configured to form upon the substrate an inspection target structure, a periphery of the inspection target structure being formed so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment.

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