Lithographic apparatus, substrate and device manufacturing method
First Claim
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1. A lithographic apparatus comprising:
- an illumination system configured to condition a radiation beam;
a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
a substrate table configured to hold the substrate; and
a projection system configured to project the patterned radiation beam onto a target portion of the substrate,wherein the lithographic apparatus is configured to form upon the substrate an inspection target structure, a periphery of the inspection target structure being formed so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment.
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Abstract
A method uses a lithographic apparatus to form an inspection target structure upon a substrate. The method comprises forming the periphery of the inspection target structure so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. This may be achieved by providing a progressive change in the optical index at the periphery of the target structure.
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Citations
9 Claims
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1. A lithographic apparatus comprising:
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an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold the substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus is configured to form upon the substrate an inspection target structure, a periphery of the inspection target structure being formed so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification