Illumination system for a microlithographic projection exposure apparatus

• US 9,575,414 B2
• Filed: 11/19/2015
• Issued: 02/21/2017
• Est. Priority Date: 02/17/2006
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: Layh, Michael, Wangler, Johannes, Siekmann, Heiko, Weible, Kenneth, Scharnweber, Ralf, Maul, Manfred, Deguenther, Markus, Scholz, Axel, Spengler, Uwe, Voelkel, Reinhard
• Primary Examiner(s): KREUTZER, COLIN WRIGHT
• Application Number:
  US14/946,284
• Publication Number:
  US 20160077446A1
• Time in Patent Office: 460 Days
• Field of Search: 355/53, 355/67, 355/71, 355/77, 359/619, 359621-624, 359/626, 359/628
• US Class Current: 1/1
• CPC Class Codes: G02B 27/0911 Anamorphotic systems
• CPC Class Codes: G02B 3/0056 arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70083 Non-homogeneous intensity distribution in the mask plane
• CPC Class Codes: G03F 7/70158 Diffractive optical elements
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Abstract

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Claims

1. An optical system, comprising:

an optical integrator configured so that, when light is incident thereon, the optical integrator produces secondary light sources;

a first scattering structure arranged, along a light propagation direction of the system, in front of the optical integrator, the first scattering structure comprising first subelements configured to introduces a divergence of incident light only in one direction; and

a second scattering structure arranged, along a light propagation direction of the system, behind the optical integrator, the second scattering structure comprising second subelements configured to introduce a divergence of incident light in two directions,

wherein the system is a microlithographic illumination system.

2. The optical system of claim 1, wherein:

the optical integrator comprises a fly-eye integrator;

the fly-eye integrator comprises first and second integrator members; and

each of the first and second integrator members comprises a plurality of focusing optical subelements.

3. The optical system of claim 1, wherein, in a direction perpendicular to an optical axis of the optical system, the first optical subelements have a first pitch and the second optical subelements have a second pitch different from the first pitch.

4. The optical system of claim 3, wherein the first pitch is prime to the second pitch.

5. The optical system of claim 1, wherein the second optical subelements are arranged in a non-periodic array.

6. The optical system of claim 1, wherein each of the second optical subelements comprises a microlens.

7. The optical system of claim 6, wherein at least some of the microlenses have a cylindrical shape.

8. The optical system of claim 1, wherein each of the second optical subelements is configured to produce an anamorphic angular light distribution during use of the optical system so that the divergence is introduced to different extents in orthogonal directions.

9. The optical system of claim 1, wherein the first optical subelements have shapes defined by first borderlines, the second optical subelements have shapes defined by second borderlines, the first and second borderlines define an angle which is greater than 0.1°

and less than 89.9°

.

10. The optical system of claim 1, wherein the second scattering structure comprises first and second kinds of second optical subelements, the first kind of optical subelements are configured to introduce the divergence in a first direction during use of the optical system, and the second kind of optical subelements are configured to introduce the divergence in a second direction different from the first direction.

11. The optical system of claim 10, wherein:

the optical system is contained in a microlithographic projection exposure apparatus which has a scan direction; and

the first kind of optical subelements are configured so that, during use of the optical system, the first kind of optical subelements produce a Gaussian angular light distribution in the scan direction of the microlithographic projection exposure apparatus.

12. The optical system of claim 11, wherein the Gaussian angular light distribution is approximated by a superposition of a plurality of substantially rectangular angular distributions of different width.

13. The optical system of claim 12, wherein the second type of optical subelements are cylindrical microlenses having different pitches.

14. The optical system of claim 1, wherein the first and second scattering structures are configured to modify the angular distribution during use of the optical system in a way that would be obtained, in the absence of the at least one scattering structure, by enlarging the secondary light sources such that they abut or overlap.

15. An apparatus, comprising:

an optical system according to claim 1,

wherein the apparatus is microlithographic projection exposure apparatus.

16. The apparatus of claim 15, wherein:

the apparatus has a scan direction; and

the second kind of optical subelements are configured so that, during use of the optical system, the second kind of optical subelements produce a rectangular angular light distribution perpendicular to the scan direction of the microlithographic projection exposure apparatus.

17. The apparatus of claim 15, wherein the first and second kinds of optical subelements, respectively, are on opposite sides of a common support.

18. An optical system, comprising:

an optical integrator comprising a plurality of focusing optical subelements;

a first scattering structure arranged, along a light propagation direction of the system, in front of the optical integrator, wherein the first scattering structure is configured to increase a geometrical optical flux only in one direction; and

a second scattering structure arranged, along a light propagation direction of the system, behind the optical integrator wherein the second scattering structure is configured to increase the geometrical optical flux in two directions,

wherein the system is a microlithographic illumination system.

19. The optical system of claim 18, wherein the two directions are orthogonal.

20. The optical system of claim 18, wherein the optical integrator comprises a fly-eye integrator comprising first and second integrator members, and each of the first and second integrator members comprises a plurality of focusing optical subelements, and wherein the first scattering structure is configured to increase the divergence to such an extent that light, which passes through a focusing optical element of the first integrator member, is distributed over the entire surface of a focusing optical element of the second integrator member.

21. The optical system of claim 18, wherein the optical system is contained in a microlithographic projection exposure apparatus which has a scan direction, and wherein the one direction, in which the first scattering structure increases the geometrical optical flux, is perpendicular to the scan direction and to an optical axis of the optical system.

22. An optical system, comprising:

a device comprising a plurality of optical subelements arranged at least substantially in a plane;

a first scattering structure arranged, along a light propagation direction of the system, in front of the device, the first scattering structure configured to scatter only in one direction; and

a second scattering structure arranged, along a light propagation direction of the system, behind the device, the second scattering structure configured to scatter in two directions;

wherein the system is a microlithographic illumination system.