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Method to form a 3D semiconductor device

  • US 9,577,642 B2
  • Filed: 11/07/2010
  • Issued: 02/21/2017
  • Est. Priority Date: 04/14/2009
  • Status: Active Grant
First Claim
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1. A method to form a 3D integrated circuit, the method comprising:

  • fabricating two or more devices;

    connecting the devices together to form the 3D integrated circuit,wherein at least one of said devices has at least one unused designated dice line and at least one of said devices is a configurable device; and

    interconnecting at least two of the devices using Through Silicon Vias,wherein said designated dice line is part of a plurality of designated dice lines designed to allow choice of amount of logic or memory or input/output cells for said at least one of said devices.

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