Diffuser support

• US 9,580,804 B2
• Filed: 03/29/2010
• Issued: 02/28/2017
• Est. Priority Date: 06/22/2007
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: White, John M., Tiner, Robin L., Chang, Yeh Kurt
• Primary Examiner(s): CHEN, KEATH T
• Application Number:
  US12/749,172
• Publication Number:
  US 20100181024A1
• Time in Patent Office: 2,528 Days
• Field of Search: 156/345.34, 118/715
• US Class Current: 1/1
• CPC Class Codes: C23C 16/45565 Shower nozzles

Abstract

Embodiments of gas distribution apparatus comprise a diffuser support member coupled to a diffuser and movably disposed through a backing plate. Embodiments of methods of processing a substrate on a substrate receiving surface of a substrate support comprise providing a diffuser in which a diffuser support member supports the diffuser and is movably disposed through the backing plate.

Claims

1. A gas distribution apparatus for a plasma processing chamber, comprising:

a backing plate;

a diffuser disposed downstream of the backing plate;

a frame structure disposed outside of the plasma processing chamber, the frame structure being spaced apart from the processing chamber by two or more support members; and

a diffuser support member coupled to the frame structure and the diffuser, the diffuser support member being movably disposed through and spaced apart from the backing plate such that a gap is present therebetween, wherein the backing plate is movable independent of the diffuser when the diffuser is coupled with the diffuser support member and the frame structure.

2. The apparatus of claim 1, wherein the backing plate has an opening and the diffuser support member is movably disposed therethrough.

3. The apparatus of claim 2, further comprising a sealing device disposed on the diffuser support member.

4. The apparatus of claim 3, wherein the sealing device provides a vacuum seal for the opening in the backing plate.

5. The apparatus of claim 1, wherein the diffuser support member is coupled to a center region of the diffuser.

6. The apparatus of claim 5, wherein the center region comprises a region within a radius from the center of the diffuser, wherein the radius is 25% or less of a diagonal dimension of the diffuser.

7. The apparatus of claim 1, wherein the backing plate is coupled to an edge portion of the diffuser by a suspension member.

8. A plasma processing apparatus, comprising:

a chamber body including a bottom and walls;

a backing plate disposed over the chamber body;

a chamber interior volume bounded by the chamber body and the backing plate;

a frame structure disposed outside of the chamber body and spaced apart from the backing plate, the frame structure comprising a length that is equal to a length or a width of the chamber body, and a width that is less than a width of the chamber body;

a diffuser disposed within the chamber interior volume;

a coupling assembly disposed between the backing plate and the frame structure, and coupled to the frame structure by one or more fasteners; and

a diffuser support member coupled to the diffuser and the coupling assembly, the diffuser support member disposed between the diffuser and the coupling assembly and movably disposed through the backing plate and spaced apart from the backing plate such that a gap is present therebetween.

9. The apparatus of claim 8, wherein the frame structure is electrically isolated from the diffuser support member.

10. The apparatus of claim 8, wherein the coupling assembly comprises a ring.

11. The apparatus of claim 8, wherein the coupling assembly comprises a hanger coupled to the frame structure and a support ring coupled to the hanger and the diffuser support member.

12. The apparatus of claim 11, wherein the support ring comprises an insulative material.

13. The apparatus of claim 11, wherein the support ring comprises a conductive material.

14. A plasma processing apparatus, comprising:

a chamber body having a lid, a bottom, walls, and a backing plate coupled to the lid defining a chamber interior volume;

a frame structure disposed outside of the chamber body and spaced apart from the chamber lid by two or more support members, the frame structure comprising a length that is equal to a length or a width of the chamber body, and a width that is less than a width of the chamber body;

a diffuser disposed within the chamber interior volume, an edge portion of the diffuser being coupled to the backing plate by a suspension member; and

at least one diffuser support member extending between the frame structure and the diffuser through an opening in the backing plate, the diffuser support member being spaced apart from the backing plate such that a gap is present between the opening and the diffuser support member that facilitates support of the diffuser independent from the backing plate such that the backing plate is movable relative to the diffuser while the diffuser is coupled to the at least one diffuser support member.

15. The apparatus of claim 14, wherein the diffuser is electrically coupled to the backing plate.

16. The apparatus of claim 14, wherein the opening in the backing plate comprises a sealing device.

17. The apparatus of claim 16, wherein the sealing device provides a vacuum seal for the opening in the backing plate.

18. The apparatus of claim 14, wherein the diffuser support member is coupled to a center region of the diffuser.

19. The apparatus of claim 14, wherein the center region comprises a region within a radius from the center of the diffuser, wherein the radius is 25% or less of a diagonal dimension of the diffuser.