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Diffuser support

  • US 9,580,804 B2
  • Filed: 03/29/2010
  • Issued: 02/28/2017
  • Est. Priority Date: 06/22/2007
  • Status: Active Grant
First Claim
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1. A gas distribution apparatus for a plasma processing chamber, comprising:

  • a backing plate;

    a diffuser disposed downstream of the backing plate;

    a frame structure disposed outside of the plasma processing chamber, the frame structure being spaced apart from the processing chamber by two or more support members; and

    a diffuser support member coupled to the frame structure and the diffuser, the diffuser support member being movably disposed through and spaced apart from the backing plate such that a gap is present therebetween, wherein the backing plate is movable independent of the diffuser when the diffuser is coupled with the diffuser support member and the frame structure.

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