Lithographic apparatus and device manufacturing method

• US 9,581,914 B2
• Filed: 04/01/2015
• Issued: 02/28/2017
• Est. Priority Date: 08/29/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Dierichs, Marcel Mathijs Theodore Marie, Donders, Sjoerd Nicolaas Lambertus, Jacobs, Johannes Henricus Wilhelmus, Jansen, Hans, Loopstra, Erik Roelof, Mertens, Jeroen Johannes Sophia Maria, Stavenga, Marco Koert, Streefkerk, Bob, Verhagen, Martinus Cornelis Maria, Seuntiens-Gruda, Lejla
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US14/676,025
• Publication Number:
  US 20150205214A1
• Time in Patent Office: 699 Days
• Field of Search: 355/53, 355/30
• US Class Current: 1/1
• CPC Class Codes: B01D 19/0031 by filtration
• CPC Class Codes: B01D 61/025 Reverse osmosis; Hyperfiltration
• CPC Class Codes: C02F 1/04 by distillation or evaporation
• CPC Class Codes: C02F 1/20 by degassing, i.e. liberation of dissolved gases degasification of liquids in general B01D19/00; arrangement of degassing apparatus in boiler feed supply F22D
• CPC Class Codes: C02F 1/28 by sorption using ion-exchange C02F1/42; sorbent compositions B01J
• CPC Class Codes: C02F 1/283 using coal, charred products, or inorganic mixtures containing them
• CPC Class Codes: C02F 1/32 with ultraviolet light
• CPC Class Codes: C02F 1/42 by ion-exchange ion-exchange in general B01J
• CPC Class Codes: C02F 1/441 by reverse osmosis
• CPC Class Codes: C02F 2103/40 from the manufacture or use of photosensitive materials
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

Claims

1. A lithographic apparatus comprising

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with an immersion liquid, the liquid supply system comprising a liquid purifier configured to at least partially purify the immersion liquid, the liquid purifier comprising at least one selected from;

a distillation unit, a de-hydrocarbonating unit configured to reduce the hydrocarbon content of the immersion liquid, a demineralizer, a filter, and/or a source to provide ultra-violet radiation;

a liquid confinement structure constructed to at least partially confine the immersion liquid to the space, wherein the substrate table is movable relative to the liquid confinement structure during projection of the patterned radiation beam and wherein the liquid confinement structure has;

an opening, in a bottom surface of the member, configured to remove fluid from the space, and

an open aperture located underneath a lower surface of the projection system and above the table, a cross-sectional dimension of the aperture being smaller than a cross-sectional dimensional of the lower surface of the projection system, the open aperture configured to allow the liquid to flow therethrough between above the open aperture and below the open aperture, and the open aperture configured to allow the radiation beam to pass therethrough; and

an inlet configured to supply the immersion liquid to the space at a position located above the aperture.

2. The lithographic apparatus of claim 1, further comprising a measurement device configured to measure a property of the immersion liquid indicative of contamination, the measurement device located downstream of the liquid purifier.

3. The lithographic apparatus of claim 2, wherein the property is one or more selected from:

electrical conductivity, pH, TOG, particles, oxygen, total silica and/or bubbles.

4. The lithographic apparatus of claim 1, further comprising a re-circulation mechanism configured to re-circulate the at least partially purified immersion liquid in the space.

5. The lithographic apparatus of claim 4, wherein the re-circulation mechanism is configured to add the at least partially purified immersion liquid upstream of the liquid purifier.

6. The lithographic apparatus of claim 4, wherein the re-circulation mechanism is configured to re-use the at least partially purified immersion liquid in the space without further purifying.

7. The lithographic apparatus of claim 4, further comprising a measurement device configured to measure a property of the immersion liquid indicative of contamination, the measurement device located downstream of the liquid purifier.

8. The lithographic apparatus of claim 7, wherein the property is one or more selected from:

electrical conductivity, pH, TOG, particles, oxygen, total silica and/or bubbles.

9. The lithographic apparatus of claim 1, wherein the liquid purifier comprises at least one selected from:

the distillation unit, the de-hydrocarbonating unit configured to reduce the hydrocarbon content of the immersion liquid, the demineralizer, and/or the source to provide ultra-violet radiation.

10. A lithographic apparatus comprising:

a movable table;

a projection system configured to project a patterned radiation beam onto a target portion of a substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the table with an immersion liquid;

a member having;

an opening, in a bottom surface of the member, configured to remove fluid from the space, and

an open aperture located underneath a lower surface of the projection system and above the table, a cross-sectional dimension of the aperture being smaller than a cross-sectional dimensional of the lower surface of the projection system, the open aperture configured to allow the immersion liquid to flow therethrough between above the open aperture and below the open aperture, and the open aperture configured to allow the radiation beam to pass therethrough;

an inlet configured to supply the immersion liquid to the space at a position located above the aperture; and

a degasser system configured to separate gas and liquid.

11. The lithographic apparatus of claim 10, wherein the degasser system is configured to degas immersion liquid being supplied to the space and to degas fluid removed through the opening.

12. The lithographic apparatus of claim 11, further comprising a re-circulation mechanism configured to re-circulate the at least partially purified immersion liquid in the space.

13. The lithographic apparatus of claim 10, further comprising a structure comprising a plurality of pores and the liquid handling system is configured to pass the fluid through the structure prior to separation of gas and liquid by the degasser system.

14. The lithographic apparatus of claim 10, wherein the degasser system comprises a membrane to separate the gas and liquid, the membrane downstream from and not in contact with the space.

15. The lithographic apparatus of claim 10, further comprising a liquid purifier configured to purify the immersion liquid.

16. A lithographic apparatus comprising:

a movable table;

a projection system configured to project a patterned radiation beam onto a target portion of a substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the table with an immersion liquid;

a liquid confinement structure constructed to at least partially confine the immersion liquid to the space, the liquid confinement structure having an external surface with an opening therein, the opening connected to an outlet passage configured to remove fluid from the space; and

a degasser system, downstream from the opening and in the fluid path of the outlet passage, configured to separate gas or liquid from the fluid removed from the space via the opening.

17. The lithographic apparatus of claim 16, wherein the degasser system is further configured to degas immersion liquid being supplied to the space.

18. The lithographic apparatus of claim 16, further comprising a re-circulation mechanism configured to re-circulate the at least partially purified immersion liquid in the space.

19. The lithographic apparatus of claim 16, wherein the degasser system comprises a membrane to separate the gas or liquid from the fluid, the membrane downstream from and not in contact with the space.

20. The lithographic apparatus of claim 16, wherein the liquid confinement structure has:

an opening, in a bottom surface of the member, configured to remove fluid from the space, and

an open aperture located underneath a lower surface of the projection system and above the table, a cross-sectional dimension of the aperture being smaller than a cross-sectional dimensional of the lower surface of the projection system, the open aperture configured to allow the liquid to flow therethrough between above the open aperture and below the open aperture, and the open aperture configured to allow the radiation beam to pass therethrough; and

further comprising an inlet configured to supply the immersion liquid to the space at a position located above the aperture.

21. The lithographic apparatus of claim 16, further comprising a liquid purifier configured to purify the immersion liquid.