Grid for plasma ion implant
First Claim
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1. A plasma ion implant system for implanting ions into a substrate so as to form lines for interdigitated back-contact solar cell, comprising:
- a processing chamber;
a grid assembly placed in the plasma chamber and dividing the processing chamber into a plasma section and ion implant section, the grid assembly configured to form beamlets of ions having divergence in a direction parallel to the lines;
a transport mechanism for transporting substrates in a travel direction and positioning the substrate under the grid assembly;
a plurality of masks, each mask placed on one substrate and comprising a plurality of elongated holes forming line segments arranged in parallel rows that are parallel to the lines for interdigitated back-contact solar cell, wherein line segments in each row are separated by bridges that block ions impinging thereupon and the line segments in each row correspond to one implanted line forming the lines for interdigitated back-contact solar cell; and
,wherein the divergence in the beamlets is configured to be in the direction parallel to the line segments of the mask so as to provide a trajectory for ions to be implanted under the bridges.
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Abstract
A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence.
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Citations
20 Claims
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1. A plasma ion implant system for implanting ions into a substrate so as to form lines for interdigitated back-contact solar cell, comprising:
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a processing chamber; a grid assembly placed in the plasma chamber and dividing the processing chamber into a plasma section and ion implant section, the grid assembly configured to form beamlets of ions having divergence in a direction parallel to the lines; a transport mechanism for transporting substrates in a travel direction and positioning the substrate under the grid assembly; a plurality of masks, each mask placed on one substrate and comprising a plurality of elongated holes forming line segments arranged in parallel rows that are parallel to the lines for interdigitated back-contact solar cell, wherein line segments in each row are separated by bridges that block ions impinging thereupon and the line segments in each row correspond to one implanted line forming the lines for interdigitated back-contact solar cell; and
,wherein the divergence in the beamlets is configured to be in the direction parallel to the line segments of the mask so as to provide a trajectory for ions to be implanted under the bridges. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method for implanting ions into a substrate so as to form lines for interdigitated back-contact solar cell, comprising:
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igniting plasma in a plasma processing chamber and extracting ions from the plasma through a grid assembly so as to form beamlets of ions having divergence in a direction parallel to the lines; placing masks on substrates to be implanted, the mask comprising a plurality of elongated holes forming line segments arranged in parallel rows, wherein line segments in each row are separated by bridges that block ions impinging thereupon and the line segments in each row correspond to one implanted line forming the lines for interdigitated back-contact solar cell; placing the substrates on a conveyor so as to be transported to implant zone; and
, directing the beamlets to pass through the mask and implant into the substrate to thereby form the parallel implanted lines for the interdigitated back-contact solar cell. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification